Etch frustration in congruent lithium niobate single crystals induced by femtosecond ultraviolet laser irradiation

Mailis, S; Brown, P; Sones, C; Zergioti, I; Eason, R

dc.contributor.author	Mailis, S	en
dc.contributor.author	Brown, P	en
dc.contributor.author	Sones, C	en
dc.contributor.author	Zergioti, I	en
dc.contributor.author	Eason, R	en
dc.date.accessioned	2014-03-01T01:51:31Z
dc.date.available	2014-03-01T01:51:31Z
dc.date.issued	2002	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/26344
dc.subject	Lithium Niobate	en
dc.subject	Single Crystal	en
dc.subject	Ultraviolet	en
dc.title	Etch frustration in congruent lithium niobate single crystals induced by femtosecond ultraviolet laser irradiation	en
heal.type	journalArticle	en
heal.identifier.primary	10.1007/s003390101040	en
heal.identifier.secondary	http://dx.doi.org/10.1007/s003390101040	en
heal.publicationDate	2002	en
heal.abstract	. Modification of the chemical etching behaviour of undoped congruent z-cut lithium niobate single crystals is achieved by pre-illumination of the –z face of the crystal with sub-ps ultraviolet laser radiation at 248 nm, at energy fluences below the threshold for ablation. A systematic study of the effect of the energy fluence and total exposure on the etch frustration is presented.	en
heal.journalName	Applied Physics A-materials Science & Processing	en
dc.identifier.doi	10.1007/s003390101040	en