dc.contributor.author |
Panayiotatos, Y |
en |
dc.contributor.author |
Patsalas, P |
en |
dc.contributor.author |
Charitidis, C |
en |
dc.contributor.author |
Logothetidis, S |
en |
dc.date.accessioned |
2014-03-01T01:51:37Z |
|
dc.date.available |
2014-03-01T01:51:37Z |
|
dc.date.issued |
2002 |
en |
dc.identifier.uri |
https://dspace.lib.ntua.gr/xmlui/handle/123456789/26374 |
|
dc.subject |
Boron Nitride |
en |
dc.subject |
Growth Mechanism |
en |
dc.subject |
Growth Process |
en |
dc.subject |
Magnetron Sputtering |
en |
dc.subject |
Refractive Index |
en |
dc.subject |
Rf Magnetron Sputtering |
en |
dc.subject |
Room Temperature |
en |
dc.subject |
Spectroscopic Ellipsometry |
en |
dc.subject |
Wear Resistance |
en |
dc.subject |
X Ray Reflectivity |
en |
dc.title |
Mechanical performance and growth characteristics of boron nitride films with respect to their optical, compositional properties and density |
en |
heal.type |
journalArticle |
en |
heal.identifier.primary |
10.1016/S0257-8972(01)01624-3 |
en |
heal.identifier.secondary |
http://dx.doi.org/10.1016/S0257-8972(01)01624-3 |
en |
heal.publicationDate |
2002 |
en |
heal.abstract |
We present a study of the growth processes of sputtered BN films, deposited on c-Si (001) substrates, at room temperature (RT) by rf magnetron sputtering. Nanoindentation (hardness ∼21 GPa), density (∼2.6 g/cm3) and roughness by X-ray reflectivity and stress measurements indicated the existence of sp3-bonded BN with properties similar to those of crystalline BN being superior for optical applications due |
en |
heal.journalName |
Surface & Coatings Technology |
en |
dc.identifier.doi |
10.1016/S0257-8972(01)01624-3 |
en |