A quantitative study of the nano-scratch behavior of boron and carbon nitride films

Charitidis, C; Panayiotatos, Y; Logothetidis, S

dc.contributor.author	Charitidis, C	en
dc.contributor.author	Panayiotatos, Y	en
dc.contributor.author	Logothetidis, S	en
dc.date.accessioned	2014-03-01T01:52:26Z
dc.date.available	2014-03-01T01:52:26Z
dc.date.issued	2003	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/26619
dc.subject	Elastic Modulus	en
dc.subject	Force Measurement	en
dc.subject	Friction Coefficient	en
dc.subject	Magnetron Sputtering	en
dc.subject	Mechanical Property	en
dc.subject	Physical Vapor Deposition	en
dc.subject	Plastic Deformation	en
dc.subject	Room Temperature	en
dc.subject	Wear Resistance	en
dc.title	A quantitative study of the nano-scratch behavior of boron and carbon nitride films	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0925-9635(02)00268-6	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0925-9635(02)00268-6	en
heal.publicationDate	2003	en
heal.abstract	The nano-scratch tests of amorphous boron and carbon nitride films prepared by r.f. magnetron sputtering onto c-Si (001) substrates, at room temperature, were performed by a Nano Indenter XP system with a lateral-force measuring attachment. The films’ hardness and elastic modulus were determined by nanoindentation employing continuous stiffness measurements. Low load (2–20 mN) scratch tests were used to evaluate the	en
heal.journalName	Diamond and Related Materials	en
dc.identifier.doi	10.1016/S0925-9635(02)00268-6	en