Microstructure and nanomechanical and optical properties of single- and multi-layer carbon films synthesized by radio frequency sputtering

Lu, W; Komvopoulos, K; Patsalas, P; Charitidis, C; Gioti, M; Logothetidis, S

dc.contributor.author	Lu, W	en
dc.contributor.author	Komvopoulos, K	en
dc.contributor.author	Patsalas, P	en
dc.contributor.author	Charitidis, C	en
dc.contributor.author	Gioti, M	en
dc.contributor.author	Logothetidis, S	en
dc.date.accessioned	2014-03-01T01:52:44Z
dc.date.available	2014-03-01T01:52:44Z
dc.date.issued	2003	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/26714
dc.subject	Amorphous Carbon	en
dc.subject	Elastic Modulus	en
dc.subject	Ion Bombardment	en
dc.subject	Microstructures	en
dc.subject	Nitrogen	en
dc.subject	Optical Absorption	en
dc.subject	Optical Properties	en
dc.subject	Radio Frequency	en
dc.subject	Residual Stress	en
dc.subject	Spectroscopic Ellipsometry	en
dc.subject	X Ray Diffraction	en
dc.subject	X Ray Reflectivity	en
dc.title	Microstructure and nanomechanical and optical properties of single- and multi-layer carbon films synthesized by radio frequency sputtering	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0257-8972(02)00841-1	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0257-8972(02)00841-1	en
heal.publicationDate	2003	en
heal.abstract	Submicrometer-thick hard carbon films were deposited on smooth Si(100) substrates by radio frequency sputtering. To avoid the development of high residual stresses during film growth under energetic ion bombardment, films were synthesized by either sputtering alternating ultrathin layers of soft and hard amorphous carbon (a-C) or by compounding a-C films with small amounts of nitrogen during deposition. Hardness and elastic	en
heal.journalName	Surface & Coatings Technology	en
dc.identifier.doi	10.1016/S0257-8972(02)00841-1	en