Sub-ps laser microstructuring of soft X-ray Mo/Si multilayer gratings

Majkova, E; Luby, S; Senderak, R; Chushkin, Y; Jergel, M; Zergioti, I; Papazoglou, D; Manousaki, A; Fotakis, C

dc.contributor.author	Majkova, E	en
dc.contributor.author	Luby, S	en
dc.contributor.author	Senderak, R	en
dc.contributor.author	Chushkin, Y	en
dc.contributor.author	Jergel, M	en
dc.contributor.author	Zergioti, I	en
dc.contributor.author	Papazoglou, D	en
dc.contributor.author	Manousaki, A	en
dc.contributor.author	Fotakis, C	en
dc.date.accessioned	2014-03-01T01:52:53Z
dc.date.available	2014-03-01T01:52:53Z
dc.date.issued	2003	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/26764
dc.subject	Atomic Force Microscopy	en
dc.subject	High Spatial Resolution	en
dc.subject	Laser Processing	en
dc.subject	Microstructures	en
dc.subject	Scanning Electron Microscopy	en
dc.subject	X-ray Optics	en
dc.subject	X Ray Reflectivity	en
dc.subject	Soft X Ray	en
dc.title	Sub-ps laser microstructuring of soft X-ray Mo/Si multilayer gratings	en
heal.type	journalArticle	en
heal.identifier.primary	10.1007/s00339-002-1952-0	en
heal.identifier.secondary	http://dx.doi.org/10.1007/s00339-002-1952-0	en
heal.publicationDate	2003	en
heal.abstract	. The sub-picosecond laser microstructuring of multilayer gratings is presented in this paper. A micromachining system operating with a 0.5 ps KrF laser at 248 nm was used to etch grating structures with a groove width of 1–2 μm in Mo/Si and Si/Mo multilayers. Atomic force microscopy, scanning electron microscopy and X-ray reflectivity were used to characterize the microetched patterns. The ω-scans around	en
heal.journalName	Applied Physics A-materials Science & Processing	en
dc.identifier.doi	10.1007/s00339-002-1952-0	en