The effect of crystal structure and morphology on the optical properties of chromium nitride thin films

Logothetidis, S; Patsalas, P; Sarakinos, K; Charitidis, C; Metaxa, C

dc.contributor.author	Logothetidis, S	en
dc.contributor.author	Patsalas, P	en
dc.contributor.author	Sarakinos, K	en
dc.contributor.author	Charitidis, C	en
dc.contributor.author	Metaxa, C	en
dc.date.accessioned	2014-03-01T01:53:31Z
dc.date.available	2014-03-01T01:53:31Z
dc.date.issued	2004	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/27064
dc.subject	Chromium	en
dc.subject	Crystal Structure	en
dc.subject	Effective Medium Theory	en
dc.subject	Electron Density	en
dc.subject	Grain Growth	en
dc.subject	Magnetron Sputtering	en
dc.subject	Microstructures	en
dc.subject	Optical Properties	en
dc.subject	Single Crystal	en
dc.subject	Spectroscopic Ellipsometry	en
dc.subject	Thin Film	en
dc.subject	Volume Fraction	en
dc.subject	X Ray Diffraction	en
dc.title	The effect of crystal structure and morphology on the optical properties of chromium nitride thin films	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/j.surfcoat.2003.10.108	en
heal.identifier.secondary	http://dx.doi.org/10.1016/j.surfcoat.2003.10.108	en
heal.publicationDate	2004	en
heal.abstract	We study the microstructure of various CrxNy (1<x<2, y∼1) coatings grown by unbalanced reactive magnetron sputtering (UBRMS), using X-ray diffraction (XRD) and reflectivity (XRR). The coatings consist of various CrN phases, depending on the growth conditions. XRD has shown that a Cr adhesion layer below CrxNy eliminates the stress and promotes the growth of bigger grains. XRR determined the film	en
heal.journalName	Surface & Coatings Technology	en
dc.identifier.doi	10.1016/j.surfcoat.2003.10.108	en