Effects of normal load on nanotribological properties of sputtered carbon nitride films

Charitidis, C; Logothetidis, S

dc.contributor.author	Charitidis, C	en
dc.contributor.author	Logothetidis, S	en
dc.date.accessioned	2014-03-01T01:54:12Z
dc.date.available	2014-03-01T01:54:12Z
dc.date.issued	2005	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/27242
dc.subject	Amorphous Carbon	en
dc.subject	Atomic Force Microscopy	en
dc.subject	Carrying Capacity	en
dc.subject	Coefficient of Friction	en
dc.subject	High Energy	en
dc.subject	Ion Bombardment	en
dc.subject	Plastic Deformation	en
dc.subject	Reactive Sputtering	en
dc.subject	Thin Film	en
dc.title	Effects of normal load on nanotribological properties of sputtered carbon nitride films	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/j.diamond.2004.07.022	en
heal.identifier.secondary	http://dx.doi.org/10.1016/j.diamond.2004.07.022	en
heal.publicationDate	2005	en
heal.abstract	The nanotribological properties of amorphous carbon nitride (CNx) films of ∼380 nm thickness were investigated, in the normal (contact) load range of 2–20 mN, using a Berkovich diamond indenter. The amorphous CNx films tested in this work were grown on Si(100) substrates by reactive sputtering and energetic ion bombardment during deposition (IBD). The dependence of the friction behavior of the	en
heal.journalName	Diamond and Related Materials	en
dc.identifier.doi	10.1016/j.diamond.2004.07.022	en