dc.contributor.author |
Claverie, A |
en |
dc.contributor.author |
Bonafos, C |
en |
dc.contributor.author |
Assayag, G |
en |
dc.contributor.author |
Schamm, S |
en |
dc.contributor.author |
Cherkashin, N |
en |
dc.contributor.author |
Paillard, V |
en |
dc.contributor.author |
Dimitrakis, P |
en |
dc.contributor.author |
Kapetenakis, E |
en |
dc.contributor.author |
Tsoukalas, D |
en |
dc.contributor.author |
Muller, T |
en |
dc.contributor.author |
Schmidt, B |
en |
dc.contributor.author |
Heinig, K |
en |
dc.contributor.author |
Perego, M |
en |
dc.contributor.author |
Fanciulli, M |
en |
dc.contributor.author |
Mathiot, D |
en |
dc.contributor.author |
Carrada, M |
en |
dc.contributor.author |
Normand, P |
en |
dc.date.accessioned |
2014-03-01T01:55:05Z |
|
dc.date.available |
2014-03-01T01:55:05Z |
|
dc.date.issued |
2006 |
en |
dc.identifier.uri |
https://dspace.lib.ntua.gr/xmlui/handle/123456789/27589 |
|
dc.subject |
Ion Implantation |
en |
dc.subject |
Materials Science |
en |
dc.title |
Materials Science Issues for the Fabrication of Nanocrystal Memory Devices by Ultra Low Energy Ion Implantation |
en |
heal.type |
journalArticle |
en |
heal.identifier.primary |
10.4028/www.scientific.net/DDF.258-260.531 |
en |
heal.identifier.secondary |
http://dx.doi.org/10.4028/www.scientific.net/DDF.258-260.531 |
en |
heal.publicationDate |
2006 |
en |
heal.journalName |
Defect and Diffusion Forum |
en |
dc.identifier.doi |
10.4028/www.scientific.net/DDF.258-260.531 |
en |