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Hydrogen microsensor based on NiO thin films

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dc.contributor.author Fasaki, I en
dc.contributor.author Antoniadou, M en
dc.contributor.author Giannoudakos, A en
dc.contributor.author Stamataki, M en
dc.contributor.author Kompitsas, M en
dc.contributor.author Roubani-Kalantzopoulou, F en
dc.contributor.author Hotovy, I en
dc.contributor.author Rehacek, V en
dc.date.accessioned 2014-03-01T01:57:09Z
dc.date.available 2014-03-01T01:57:09Z
dc.date.issued 2008 en
dc.identifier.issn 18746500 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/28364
dc.subject Gas sensors en
dc.subject H2 en
dc.subject NiO en
dc.title Hydrogen microsensor based on NiO thin films en
heal.type journalArticle en
heal.identifier.primary 10.1007/978-1-4020-8903-9-35 en
heal.identifier.secondary http://dx.doi.org/10.1007/978-1-4020-8903-9-35 en
heal.publicationDate 2008 en
heal.abstract A multitude of industries use H2 either as part of their process or as a fuel. All these applications motivate nowadays the development of hydrogen sensor devices which enable its safe and controlled use. Since H 2 is explosive above the lower explosion limit at 40,000 ppm, devices which permit the detection of its presence and measure its concentration become indispensable. In this work, we present a microsensor based on NiO thin films produced with dc reactive magnetron sputtering on GaAs, with an incorporated Pt heater, all on a DO-8 package ready for use. The microsensor was tested to H2 concentrations 5,000 and 10,000 ppm at different working temperatures. The change of the electrical resistance of NiO thin films was the signal for hydrogen sensing. The response of the sensor was not proportional to concentration of the gas neither to the working temperature. © 2008 Springer Netherlands. en
heal.journalName NATO Science for Peace and Security Series B: Physics and Biophysics en
dc.identifier.doi 10.1007/978-1-4020-8903-9-35 en
dc.identifier.spage 379 en
dc.identifier.epage 382 en


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