dc.contributor.author | DAVAZOGLOU, D | en |
dc.contributor.author | MOUTSAKIS, A | en |
dc.contributor.author | VALAMONTES, V | en |
dc.contributor.author | PSYCHARIS, V | en |
dc.contributor.author | TSAMAKIS, D | en |
dc.date.accessioned | 2014-03-01T01:59:09Z | |
dc.date.available | 2014-03-01T01:59:09Z | |
dc.date.issued | 2010 | en |
dc.identifier.uri | https://dspace.lib.ntua.gr/xmlui/handle/123456789/28862 | |
dc.subject | Chemical Vapor Deposited | en |
dc.subject | Thin Film | en |
dc.subject | Tungsten Oxide | en |
dc.subject | Low Pressure | en |
dc.title | ChemInform Abstract: Tungsten Oxide Thin Films Chemically Vapor Deposited at Low Pressure by W(CO)6 Pyrolysis | en |
heal.type | journalArticle | en |
heal.identifier.primary | 10.1002/chin.199722026 | en |
heal.identifier.secondary | http://dx.doi.org/10.1002/chin.199722026 | en |
heal.publicationDate | 2010 | en |
heal.journalName | Cheminform | en |
dc.identifier.doi | 10.1002/chin.199722026 | en |
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