Evaluating the robustness of top coatings comprising plasma-deposited fluorocarbons in electrowetting systems

Papageorgiou, DP; Koumoulos, EP; Charitidis, CA; Boudouvis, AG; Papathanasiou, AG

dc.contributor.author	Papageorgiou, DP	en
dc.contributor.author	Koumoulos, EP	en
dc.contributor.author	Charitidis, CA	en
dc.contributor.author	Boudouvis, AG	en
dc.contributor.author	Papathanasiou, AG	en
dc.date.accessioned	2014-03-01T02:08:53Z
dc.date.available	2014-03-01T02:08:53Z
dc.date.issued	2012	en
dc.identifier.issn	01694243	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/29746
dc.subject	adhesion strength	en
dc.subject	Electrowetting	en
dc.subject	hydrophobic coating	en
dc.subject	nanoscratch	en
dc.subject	plasma fluorocarbon deposition	en
dc.subject.other	Angle modulation	en
dc.subject.other	Dielectric stack	en
dc.subject.other	Electro wetting	en
dc.subject.other	High electric fields	en
dc.subject.other	High voltage	en
dc.subject.other	Hydrophobic coatings	en
dc.subject.other	Insulating layers	en
dc.subject.other	Low voltages	en
dc.subject.other	Nano-scratch	en
dc.subject.other	Saturation regime	en
dc.subject.other	Top coating	en
dc.subject.other	Adhesion	en
dc.subject.other	Bond strength (materials)	en
dc.subject.other	Coatings	en
dc.subject.other	Contact angle	en
dc.subject.other	Dielectric materials	en
dc.subject.other	Electric fields	en
dc.subject.other	Electrolysis	en
dc.subject.other	Fluorocarbons	en
dc.subject.other	Hydrophobicity	en
dc.subject.other	Nanotechnology	en
dc.subject.other	Optical microscopy	en
dc.subject.other	Plasma deposition	en
dc.subject.other	Plasmas	en
dc.subject.other	Wetting	en
dc.title	Evaluating the robustness of top coatings comprising plasma-deposited fluorocarbons in electrowetting systems	en
heal.type	journalArticle	en
heal.identifier.primary	10.1163/156856111X600226	en
heal.identifier.secondary	http://dx.doi.org/10.1163/156856111X600226	en
heal.publicationDate	2012	en
heal.abstract	Thin dielectric stacks comprising a main insulating layer and a hydrophobic top coating are commonly used in low voltage electrowetting systems. However, in most cases, thin dielectrics fail to endure persistent electrowetting testing at high voltages, namely beyond the saturation onset, as electrolysis indicates dielectric failure. Careful sample inspection via optical microscopy revealed possible local delamination of the top coating under high electric fields. Thus, improvement in the adhesion strength of the hydrophobic top coating to the main dielectric is attempted through a plasma-deposited fluorocarbon interlayer. Interestingly enough the proposed dielectric stack exhibited (a) resistance to dielectric breakdown, (b) higher contact angle modulation range and (c) electrowetting cycle reversibility. Appearance of electrolysis in the saturation regime is inhibited, suggesting the use of this hydrophobic dielectric stack for the design of more efficient electrowetting systems. The possible causes of the improved performance are investigated by nanoscratch characterization. © 2012 Copyright Taylor and Francis Group, LLC.	en
heal.journalName	Journal of Adhesion Science and Technology	en
dc.identifier.doi	10.1163/156856111X600226	en
dc.identifier.volume	26	en
dc.identifier.issue	12-17	en
dc.identifier.spage	2001	en
dc.identifier.epage	2015	en