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Fundamental aspects of near-field emission scanning electron microscopy

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dc.contributor.author Zanin, DA en
dc.contributor.author Cabrera, H en
dc.contributor.author De Pietro, LG en
dc.contributor.author Pikulski, M en
dc.contributor.author Goldmann, M en
dc.contributor.author Ramsperger, U en
dc.contributor.author Pescia, D en
dc.contributor.author Xanthakis, JP en
dc.date.accessioned 2014-03-01T02:09:15Z
dc.date.available 2014-03-01T02:09:15Z
dc.date.issued 2012 en
dc.identifier.issn 10765670 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/29784
dc.subject electron microscopy en
dc.subject Field emission en
dc.subject nanotechnology en
dc.subject.other Characteristic length en
dc.subject.other Conversion factor en
dc.subject.other Near-field emission en
dc.subject.other Positioning techniques en
dc.subject.other Secondary electrons en
dc.subject.other Spatial resolution en
dc.subject.other Strong electric fields en
dc.subject.other Subnanometers en
dc.subject.other Tip surfaces en
dc.subject.other Topographic images en
dc.subject.other Vertical resolution en
dc.subject.other Electric fields en
dc.subject.other Electron microscopy en
dc.subject.other Electrons en
dc.subject.other Field emission en
dc.subject.other Field emission microscopes en
dc.subject.other Nanotechnology en
dc.subject.other Scanning electron microscopy en
dc.subject.other Uncertainty analysis en
dc.subject.other Electron emission en
dc.title Fundamental aspects of near-field emission scanning electron microscopy en
heal.type journalArticle en
heal.identifier.primary 10.1016/B978-0-12-394396-5.00005-1 en
heal.identifier.secondary http://dx.doi.org/10.1016/B978-0-12-394396-5.00005-1 en
heal.publicationDate 2012 en
heal.abstract The fundamental aspects of near-field emission scanning electron microscopy (NFESEM) were studied. In NFESEM electrons are emitted from a tip through field emission (FE), interact with the sample and produce secondary electrons (SE), which are ejected from the surface and can escape the strong electric field environment in the tip-surface region. By scanning the tip parallel to the surface, using the ultra-precise positioning techniques known from STM technology and measuring the FE and/or SE current, a topographic image of the surface was obtained, with subnanometer spatial vertical resolution and a few nanometers of lateral spatial resolution. NFESEM, instead, is ideally performed in constant height (CH) mode, that is, while scanning the distance between tip and surface is kept at a predefined value. The study revealed that the closeness between the two electrodes represented by the tip and the surface introduces a characteristic length d, the distance tip surface that seems to remove the uncertainty about the conversion factor and allows the electric field at the tip to be estimated quite precisely. en
heal.journalName Advances in Imaging and Electron Physics en
dc.identifier.doi 10.1016/B978-0-12-394396-5.00005-1 en
dc.identifier.volume 170 en
dc.identifier.spage 227 en
dc.identifier.epage 258 en


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