Fundamental aspects of near-field emission scanning electron microscopy

Zanin, DA; Cabrera, H; De Pietro, LG; Pikulski, M; Goldmann, M; Ramsperger, U; Pescia, D; Xanthakis, JP

dc.contributor.author	Zanin, DA	en
dc.contributor.author	Cabrera, H	en
dc.contributor.author	De Pietro, LG	en
dc.contributor.author	Pikulski, M	en
dc.contributor.author	Goldmann, M	en
dc.contributor.author	Ramsperger, U	en
dc.contributor.author	Pescia, D	en
dc.contributor.author	Xanthakis, JP	en
dc.date.accessioned	2014-03-01T02:09:15Z
dc.date.available	2014-03-01T02:09:15Z
dc.date.issued	2012	en
dc.identifier.issn	10765670	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/29784
dc.subject	electron microscopy	en
dc.subject	Field emission	en
dc.subject	nanotechnology	en
dc.subject.other	Characteristic length	en
dc.subject.other	Conversion factor	en
dc.subject.other	Near-field emission	en
dc.subject.other	Positioning techniques	en
dc.subject.other	Secondary electrons	en
dc.subject.other	Spatial resolution	en
dc.subject.other	Strong electric fields	en
dc.subject.other	Subnanometers	en
dc.subject.other	Tip surfaces	en
dc.subject.other	Topographic images	en
dc.subject.other	Vertical resolution	en
dc.subject.other	Electric fields	en
dc.subject.other	Electron microscopy	en
dc.subject.other	Electrons	en
dc.subject.other	Field emission	en
dc.subject.other	Field emission microscopes	en
dc.subject.other	Nanotechnology	en
dc.subject.other	Scanning electron microscopy	en
dc.subject.other	Uncertainty analysis	en
dc.subject.other	Electron emission	en
dc.title	Fundamental aspects of near-field emission scanning electron microscopy	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/B978-0-12-394396-5.00005-1	en
heal.identifier.secondary	http://dx.doi.org/10.1016/B978-0-12-394396-5.00005-1	en
heal.publicationDate	2012	en
heal.abstract	The fundamental aspects of near-field emission scanning electron microscopy (NFESEM) were studied. In NFESEM electrons are emitted from a tip through field emission (FE), interact with the sample and produce secondary electrons (SE), which are ejected from the surface and can escape the strong electric field environment in the tip-surface region. By scanning the tip parallel to the surface, using the ultra-precise positioning techniques known from STM technology and measuring the FE and/or SE current, a topographic image of the surface was obtained, with subnanometer spatial vertical resolution and a few nanometers of lateral spatial resolution. NFESEM, instead, is ideally performed in constant height (CH) mode, that is, while scanning the distance between tip and surface is kept at a predefined value. The study revealed that the closeness between the two electrodes represented by the tip and the surface introduces a characteristic length d, the distance tip surface that seems to remove the uncertainty about the conversion factor and allows the electric field at the tip to be estimated quite precisely.	en
heal.journalName	Advances in Imaging and Electron Physics	en
dc.identifier.doi	10.1016/B978-0-12-394396-5.00005-1	en
dc.identifier.volume	170	en
dc.identifier.spage	227	en
dc.identifier.epage	258	en