Growth, structural and mechanical characterization and reliability of chemical vapor deposited Co and Co3O4 thin films as candidate materials for sensing applications

Tsikourkitoudi, VP; Koumoulos, EP; Papadopoulos, N; Hristoforou, E; Charitidis, CA

dc.contributor.author	Tsikourkitoudi, VP	en
dc.contributor.author	Koumoulos, EP	en
dc.contributor.author	Papadopoulos, N	en
dc.contributor.author	Hristoforou, E	en
dc.contributor.author	Charitidis, CA	en
dc.date.accessioned	2014-03-01T02:09:16Z
dc.date.available	2014-03-01T02:09:16Z
dc.date.issued	2012	en
dc.identifier.issn	14544164	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/29790
dc.relation.uri	http://www.scopus.com/inward/record.url?eid=2-s2.0-84860428774&partnerID=40&md5=3e6b5462c25b8492f79ae9e4a1f941a3	en
dc.subject	Chemical vapor deposition	en
dc.subject	Co thin films	en
dc.subject	Co3O4 thin films	en
dc.subject	Nanoindentation	en
dc.subject	Nanomechanical properties	en
dc.title	Growth, structural and mechanical characterization and reliability of chemical vapor deposited Co and Co3O4 thin films as candidate materials for sensing applications	en
heal.type	journalArticle	en
heal.publicationDate	2012	en
heal.abstract	The adhesion and mechanical stability of thin film coatings on substrates is increasingly becoming a key issue in device reliability as magnetic and storage technology driven products demand smaller, thinner and more complex functional coatings. In the present study, chemical vapor deposited Co and Co3O4 thin films on SiO2 and Si substrates are produced, respectively. Chemical vapor deposition is the most widely used deposition technique which produces thin films well adherent to the substrate. Co and Co3O4 thin films can be used in innovative applications such as magnetic sensors, data storage devices and protective layers. The surface topography of the produced thin films is investigated with Atomic Force Microscopy and the mechanical behavior of them is evaluated. The produced thin films are also characterized using nanoindentation technique. Typical load-displacement curves are obtained and the local changes observed are explained. The nanomechanical properties (hardness and elastic modulus) of the thin films are obtained with Oliver & Pharr model. Finally, an evaluation of the reliability of each thin film (wear analysis) is performed using the hardness to elastic modulus ratio in correlation to the ratio of irreversible work to total work for a complete loading-unloading procedure.	en
heal.journalName	Journal of Optoelectronics and Advanced Materials	en
dc.identifier.volume	14	en
dc.identifier.issue	1-2	en
dc.identifier.spage	169	en
dc.identifier.epage	175	en