High strain sensitivity controlled by the surface density of platinum nanoparticles

Tanner, JL; Mousadakos, D; Giannakopoulos, K; Skotadis, E; Tsoukalas, D

dc.contributor.author	Tanner, JL	en
dc.contributor.author	Mousadakos, D	en
dc.contributor.author	Giannakopoulos, K	en
dc.contributor.author	Skotadis, E	en
dc.contributor.author	Tsoukalas, D	en
dc.date.accessioned	2014-03-01T02:09:17Z
dc.date.available	2014-03-01T02:09:17Z
dc.date.issued	2012	en
dc.identifier.issn	09574484	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/29797
dc.subject.other	Current expression	en
dc.subject.other	Electrical resistances	en
dc.subject.other	Flexible substrate	en
dc.subject.other	High strains	en
dc.subject.other	Intermediate densities	en
dc.subject.other	Lithographic processing	en
dc.subject.other	Metallic behaviors	en
dc.subject.other	Nanoparticle array	en
dc.subject.other	Nanoparticle assemblies	en
dc.subject.other	Nanoparticle deposition	en
dc.subject.other	Nanoparticle layers	en
dc.subject.other	Platinum nanoparticles	en
dc.subject.other	Room temperature	en
dc.subject.other	Silicon Technologies	en
dc.subject.other	Strain gauge factor	en
dc.subject.other	Strain sensitivity	en
dc.subject.other	Surface density	en
dc.subject.other	Vacuum techniques	en
dc.subject.other	Platinum	en
dc.subject.other	Nanoparticles	en
dc.title	High strain sensitivity controlled by the surface density of platinum nanoparticles	en
heal.type	journalArticle	en
heal.identifier.primary	10.1088/0957-4484/23/28/285501	en
heal.identifier.secondary	http://dx.doi.org/10.1088/0957-4484/23/28/285501	en
heal.identifier.secondary	285501	en
heal.publicationDate	2012	en
heal.abstract	We report a controllable strain gauge factor obtained using a two-dimensional nanoparticle layer formed from platinum nanoparticles. A vacuum technique is used for room temperature nanoparticle deposition that allows control of the electrical resistance of the film, exhibiting semiconducting-like behavior when nanoparticle arrays cover the surface below a threshold value while above it a metallic behavior is prevalent. The highest sensitivity is obtained for intermediate density values of the nanoparticle assemblies, which could be explained using a tunneling and hopping current expression. The device, which exhibits more than one order of magnitude higher strain sensitivity than continuous metallic films, is fabricated at room temperature through standard lithographic processing allowing for miniaturization and easy integration in silicon technology or flexible substrates. © 2012 IOP Publishing Ltd.	en
heal.journalName	Nanotechnology	en
dc.identifier.doi	10.1088/0957-4484/23/28/285501	en
dc.identifier.volume	23	en
dc.identifier.issue	28	en