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Emissivity measurements on historic building materials using dual wavelength infrared thermography

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dc.contributor.author Moropoulou, A en
dc.contributor.author Avdelidis, NP en
dc.date.accessioned 2014-03-01T02:41:52Z
dc.date.available 2014-03-01T02:41:52Z
dc.date.issued 2001 en
dc.identifier.issn 0277786X en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/30639
dc.subject Dual band infrared thermography en
dc.subject Emissivity en
dc.subject Historic building materials en
dc.subject.other Building materials en
dc.subject.other Infrared spectroscopy en
dc.subject.other Light emission en
dc.subject.other Marble en
dc.subject.other Microstructure en
dc.subject.other Porous materials en
dc.subject.other Dual band infrared thermography en
dc.subject.other Thermography (imaging) en
dc.title Emissivity measurements on historic building materials using dual wavelength infrared thermography en
heal.type conferenceItem en
heal.identifier.primary 10.1117/12.420995 en
heal.identifier.secondary http://dx.doi.org/10.1117/12.420995 en
heal.publicationDate 2001 en
heal.abstract The most reliable method to obtain correct emissivity values for the infrared thermographic systems and applications is to determine the emissivity of the targets to be tested. Although this approach is not possible during in situ applications, samples of the targets can be collected and measured, as in this work, in the laboratory. In the present work, the emissivity values of selected historic building materials were measured at a variety of temperatures, in the 3-5.4 μm and 8-12 μm regions of the infrared spectrum. Porous stones from the Mediterranean area and marbles, used as historic building materials, were investigated. The examined materials presented different emissivity values, caused by their surface state and microstructure. In addition, the effect of temperature and wavelength on the emissivity values of such historic building materials was also considered. en
heal.journalName Proceedings of SPIE - The International Society for Optical Engineering en
dc.identifier.doi 10.1117/12.420995 en
dc.identifier.volume 4360 en
dc.identifier.spage 224 en
dc.identifier.epage 228 en


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