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Metal/metal-oxide/metal etalon structures grown by pulsed laser deposition

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dc.contributor.author Vainos, NA en
dc.contributor.author Tsigara, A en
dc.contributor.author Manasis, J en
dc.contributor.author Giannoudakos, A en
dc.contributor.author Mousdis, G en
dc.contributor.author Vakakis, N en
dc.contributor.author Kompitsas, M en
dc.contributor.author Klini, A en
dc.contributor.author Roubani-Kalantzopoulou, F en
dc.date.accessioned 2014-03-01T02:42:52Z
dc.date.available 2014-03-01T02:42:52Z
dc.date.issued 2004 en
dc.identifier.issn 0947-8396 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/31113
dc.subject Pulsed Laser Deposition en
dc.subject Zinc en
dc.subject.classification Materials Science, Multidisciplinary en
dc.subject.classification Physics, Applied en
dc.subject.other Absorption en
dc.subject.other Electromagnetic wave reflection en
dc.subject.other Nanostructured materials en
dc.subject.other Optical properties en
dc.subject.other Refractive index en
dc.subject.other Ultraviolet radiation en
dc.subject.other Growth parameters en
dc.subject.other Hysteresis effects en
dc.subject.other Metal etalon structures en
dc.subject.other Pulsed laser deposition en
dc.title Metal/metal-oxide/metal etalon structures grown by pulsed laser deposition en
heal.type conferenceItem en
heal.identifier.primary 10.1007/s00339-004-2791-y en
heal.identifier.secondary http://dx.doi.org/10.1007/s00339-004-2791-y en
heal.language English en
heal.publicationDate 2004 en
heal.abstract Multilayered metal/metal-oxide/metal structures are fabricated by pulsed laser deposition in alternating non-reactive and reactive oxidising conditions, by using pure metal targets. The variety of metals used includes tantalum, zinc and indium. Further to the well-known interferometric, etalon, optical behaviour the structures feature additional activation properties owing to the nanoscopic nature of the oxide materials incorporated. en
heal.publisher SPRINGER en
heal.journalName Applied Physics A: Materials Science and Processing en
dc.identifier.doi 10.1007/s00339-004-2791-y en
dc.identifier.isi ISI:000222766100159 en
dc.identifier.volume 79 en
dc.identifier.issue 4-6 en
dc.identifier.spage 1395 en
dc.identifier.epage 1397 en


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