Microstructural characterization of cylindrical Fe1-xNi x thin films

Giouroudi, I; Ktena, A; Hristoforou, E

dc.contributor.author	Giouroudi, I	en
dc.contributor.author	Ktena, A	en
dc.contributor.author	Hristoforou, E	en
dc.date.accessioned	2014-03-01T02:42:52Z
dc.date.available	2014-03-01T02:42:52Z
dc.date.issued	2004	en
dc.identifier.issn	1454-4164	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/31115
dc.relation.uri	http://www.scopus.com/inward/record.url?eid=2-s2.0-3142693618&partnerID=40&md5=c13e0f31661f30c07a8d82dee3f6ed77	en
dc.subject	Electrodeposition	en
dc.subject	Microstructural characterization	en
dc.subject	Thin films	en
dc.subject.classification	Materials Science, Multidisciplinary	en
dc.subject.classification	Optics	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Copper	en
dc.subject.other	Electrodeposition	en
dc.subject.other	Heat treatment	en
dc.subject.other	Iron compounds	en
dc.subject.other	Microstructure	en
dc.subject.other	Sensors	en
dc.subject.other	Stainless steel	en
dc.subject.other	X ray diffraction	en
dc.subject.other	Deposition temperature	en
dc.subject.other	Magnetic steering	en
dc.subject.other	Microstructural characterization	en
dc.subject.other	Thin films	en
dc.title	Microstructural characterization of cylindrical Fe1-xNi x thin films	en
heal.type	conferenceItem	en
heal.language	English	en
heal.publicationDate	2004	en
heal.abstract	Structural and microstructural characterization was performed on soft magnetic Fe1-xNix thin films on copper and stainless steel cylindrical substrates. Thin films have been prepared using an electrodeposition device with uniform cylindrical deposition ability. Plating baths, containing nickel sulfate and iron sulfate, of variable Fe/Ni ion ratio in the electrolyte have been used in order to control the stoicheiometry. The microstructural characterization and composition analysis were performed using SEM. The structure of the alloys was investigated by X-ray diffraction. All samples have been submitted to thermal treatment at 450degreesC at Ar atmosphere.	en
heal.publisher	NATL INST OPTOELECTRONICS	en
heal.journalName	Journal of Optoelectronics and Advanced Materials	en
dc.identifier.isi	ISI:000222501300045	en
dc.identifier.volume	6	en
dc.identifier.issue	2	en
dc.identifier.spage	661	en
dc.identifier.epage	666	en