Increased plasma etch resistance of thin polymeric and photoresist films

Vourdas, N; Boudouvis, AG; Gogolides, E

dc.contributor.author	Vourdas, N	en
dc.contributor.author	Boudouvis, AG	en
dc.contributor.author	Gogolides, E	en
dc.date.accessioned	2014-03-01T02:43:23Z
dc.date.available	2014-03-01T02:43:23Z
dc.date.issued	2005	en
dc.identifier.issn	0167-9317	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/31371
dc.subject	Glass transition temperature	en
dc.subject	Plasma etching	en
dc.subject	Polymers	en
dc.subject	Thin films	en
dc.subject.classification	Engineering, Electrical & Electronic	en
dc.subject.classification	Nanoscience & Nanotechnology	en
dc.subject.classification	Optics	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Ellipsometry	en
dc.subject.other	Glass transition	en
dc.subject.other	Photoresistors	en
dc.subject.other	Plasma etching	en
dc.subject.other	Polymers	en
dc.subject.other	Substrates	en
dc.subject.other	Temperature distribution	en
dc.subject.other	Commercial photoresist	en
dc.subject.other	Increased plasma etch	en
dc.subject.other	Photoresist films	en
dc.subject.other	Thin polymeric films	en
dc.subject.other	Thin films	en
dc.title	Increased plasma etch resistance of thin polymeric and photoresist films	en
heal.type	conferenceItem	en
heal.identifier.primary	10.1016/j.mee.2004.12.060	en
heal.identifier.secondary	http://dx.doi.org/10.1016/j.mee.2004.12.060	en
heal.language	English	en
heal.publicationDate	2005	en
heal.abstract	Plasma etch rate measurements of thin polymeric films are presented. Four commonly used polymers were etched (1) poly-methyl-methacrylate (PMMA), (2) poly-hydroxyethyl-methaerylate (PHEMA), (3) poly-hydroxystyrene (PHS), and (4) a commercial photoresist (GKRS). Their etch rates (ER) in a plasma reactor and their glass transition temperature (T.), were both studied as functions of the initial film thickness. The results clearly show a strong relation between the ER and the initial polymer thickness. The etch rate is decreasing as the initial polymer thickness is decreasing for films thinner than similar to 200 nm. By correlating the plasma ER rate with the T, of the polymeric films, a clear inverse relation is revealed, namely that the ER decreases when the T increases. (c) 2005 Elsevier B.V. All rights reserved.	en
heal.publisher	ELSEVIER SCIENCE BV	en
heal.journalName	Microelectronic Engineering	en
dc.identifier.doi	10.1016/j.mee.2004.12.060	en
dc.identifier.isi	ISI:000228589700078	en
dc.identifier.volume	78-79	en
dc.identifier.issue	1-4	en
dc.identifier.spage	474	en
dc.identifier.epage	478	en