dc.contributor.author |
Frantzeskakis, E |
en |
dc.contributor.author |
Tsakiridis, PE |
en |
dc.contributor.author |
Hristoforou, E |
en |
dc.date.accessioned |
2014-03-01T02:43:33Z |
|
dc.date.available |
2014-03-01T02:43:33Z |
|
dc.date.issued |
2005 |
en |
dc.identifier.issn |
1454-4164 |
en |
dc.identifier.uri |
https://dspace.lib.ntua.gr/xmlui/handle/123456789/31473 |
|
dc.relation.uri |
http://www.scopus.com/inward/record.url?eid=2-s2.0-22544459922&partnerID=40&md5=7928095aa42bde0704de54a17659eda2 |
en |
dc.subject |
Boron |
en |
dc.subject |
Optoelectronic properties |
en |
dc.subject |
Silicon (400) |
en |
dc.subject |
Thermal Diffusion |
en |
dc.subject.classification |
Materials Science, Multidisciplinary |
en |
dc.subject.classification |
Optics |
en |
dc.subject.classification |
Physics, Applied |
en |
dc.subject.other |
SILICON |
en |
dc.subject.other |
JUNCTIONS |
en |
dc.subject.other |
IMPLANTATION |
en |
dc.subject.other |
SUBMICRON |
en |
dc.subject.other |
SI(001) |
en |
dc.title |
Structural characterization and optoelectronic properties of boron thermally diffused SI (400) |
en |
heal.type |
conferenceItem |
en |
heal.language |
English |
en |
heal.publicationDate |
2005 |
en |
heal.abstract |
Thermal diffusion of boron into silicon single crystal at 1100 degrees C, followed by annealing, in inert atmosphere, has been investigated with respect to corresponding optoelectronic properties. A layer of boron powder, deposited on a silicon (400) wafer, was used as a dopant source for B. The cold resistance response of the films with respect to light of different wavelengths was used for the quantification of their optoelectronic properties. A correlation between the optoelectronic behavior and the structural characterization of the produced samples was also realized. |
en |
heal.publisher |
NATL INST OPTOELECTRONICS |
en |
heal.journalName |
Journal of Optoelectronics and Advanced Materials |
en |
dc.identifier.isi |
ISI:000229987500055 |
en |
dc.identifier.volume |
7 |
en |
dc.identifier.issue |
3 |
en |
dc.identifier.spage |
1499 |
en |
dc.identifier.epage |
1509 |
en |