Assembly of charged nanoparticles by self-electrodynamic focusing

Tang, J; Verrelli, E; Tsoukalas, D

dc.contributor.author	Tang, J	en
dc.contributor.author	Verrelli, E	en
dc.contributor.author	Tsoukalas, D	en
dc.date.accessioned	2014-03-01T02:45:58Z
dc.date.available	2014-03-01T02:45:58Z
dc.date.issued	2009	en
dc.identifier.issn	0957-4484	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/32493
dc.subject	Electric Field	en
dc.subject	Monte Carlo Simulation	en
dc.subject	Self Assembly	en
dc.subject.classification	Engineering, Multidisciplinary	en
dc.subject.classification	Nanoscience & Nanotechnology	en
dc.subject.classification	Materials Science, Multidisciplinary	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Charged nanoparticles	en
dc.subject.other	Focusing effect	en
dc.subject.other	Monte Carlo Simulation	en
dc.subject.other	Photoresist patterning	en
dc.subject.other	Photoresist patterns	en
dc.subject.other	Self assembly process	en
dc.subject.other	Semi-conducting nanoparticles	en
dc.subject.other	Silicon substrates	en
dc.subject.other	Computer simulation	en
dc.subject.other	Electric fields	en
dc.subject.other	Monte Carlo methods	en
dc.subject.other	Photoresistors	en
dc.subject.other	Photoresists	en
dc.subject.other	Self assembly	en
dc.subject.other	Semiconducting silicon	en
dc.subject.other	Semiconducting silicon compounds	en
dc.subject.other	Surface treatment	en
dc.subject.other	Nanoparticles	en
dc.title	Assembly of charged nanoparticles by self-electrodynamic focusing	en
heal.type	conferenceItem	en
heal.identifier.primary	10.1109/ESSDERC.2009.5331603	en
heal.identifier.secondary	http://dx.doi.org/10.1109/ESSDERC.2009.5331603	en
heal.identifier.secondary	5331603	en
heal.language	English	en
heal.publicationDate	2009	en
heal.abstract	We demonstrate a self-assembly process of charged metallic or semiconducting nanoparticles on silicon substrates using conventional photoresist patterning. The self-assembly of nanoparticles is mainly due to a self-electric focusing effect created by the electric field of charged nanoparticles landed on the photoresist patterns. The detailed parameters that affect the focusing effect are investigated both experimentally and theoretically using Monte Carlo simulations. The presented technique is a simple and effective method for the fabrication of patterned nanoparticle lines made from different materials. ©2009 IEEE.	en
heal.publisher	IOP PUBLISHING LTD	en
heal.journalName	ESSDERC 2009 - Proceedings of the 39th European Solid-State Device Research Conference	en
dc.identifier.doi	10.1109/ESSDERC.2009.5331603	en
dc.identifier.isi	ISI:000269077000019	en
dc.identifier.volume	20	en
dc.identifier.issue	36	en
dc.identifier.spage	456	en
dc.identifier.epage	459	en