Methane sensing properties of CuxO thin films deposited by pulsed laser deposition

Stamataki, M; Georgiou, V; Tsamakis, D; Kompitsas, M

dc.contributor.author	Stamataki, M	en
dc.contributor.author	Georgiou, V	en
dc.contributor.author	Tsamakis, D	en
dc.contributor.author	Kompitsas, M	en
dc.date.accessioned	2014-03-01T02:46:13Z
dc.date.available	2014-03-01T02:46:13Z
dc.date.issued	2009	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/32615
dc.subject	Atomic Force Microscopy	en
dc.subject	Methane	en
dc.subject	Pulsed Laser Deposition	en
dc.subject	Surface Morphology	en
dc.subject	Thin Film	en
dc.subject	Thin Film Deposition	en
dc.title	Methane sensing properties of CuxO thin films deposited by pulsed laser deposition	en
heal.type	conferenceItem	en
heal.identifier.primary	10.1109/ISDRS.2009.5378089	en
heal.identifier.secondary	5378089	en
heal.identifier.secondary	http://dx.doi.org/10.1109/ISDRS.2009.5378089	en
heal.publicationDate	2009	en
heal.abstract	In the present work, undoped CuxO thin films were deposited by pulsed laser deposition on glass and SiO2 substrates, at a constant oxygen partial pressure of 40Pa and at constant temperature of 200°C. The surface morphology of the deposited thin films was investigated by atomic force microscopy (AFM) in contact mode. The paper shows the 3D AFM images of CuxO	en
heal.journalName	2009 International Semiconductor Device Research Symposium, ISDRS '09	en
dc.identifier.doi	10.1109/ISDRS.2009.5378089	en