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Probing the electrical properties of the Si nitride/Si interface

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dc.contributor.author Tsonos, C en
dc.contributor.author Kanapitsas, A en
dc.contributor.author Karagounis, A en
dc.contributor.author Stavrakas, I en
dc.contributor.author Triantis, D en
dc.contributor.author Anastasiadis, C en
dc.contributor.author Photopoulos, P en
dc.contributor.author Vamvakas, VE en
dc.contributor.author Pissis, P en
dc.date.accessioned 2014-03-01T02:46:57Z
dc.date.available 2014-03-01T02:46:57Z
dc.date.issued 2010 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/32953
dc.subject Dielectric Relaxation en
dc.subject Electrical Properties en
dc.subject Silicon Nitride en
dc.subject.other Conductance measurement en
dc.subject.other Depletion layer en
dc.subject.other Dielectric behaviour en
dc.subject.other Dielectric relaxation spectroscopy en
dc.subject.other Electrical property en
dc.subject.other MIS structure en
dc.subject.other Relaxation mechanism en
dc.subject.other Dielectric relaxation en
dc.subject.other Microelectronics en
dc.subject.other Silicon nitride en
dc.subject.other Spectroscopy en
dc.subject.other Electric properties en
dc.title Probing the electrical properties of the Si nitride/Si interface en
heal.type conferenceItem en
heal.identifier.primary 10.1109/MIEL.2010.5490441 en
heal.identifier.secondary http://dx.doi.org/10.1109/MIEL.2010.5490441 en
heal.identifier.secondary 5490441 en
heal.publicationDate 2010 en
heal.abstract The present publication employs Dielectric Relaxation Spectroscopy for the examination of the relaxation mechanisms in silicon nitride MIS structures. These results are combined with capacitance and conductance measurements in order to give a more complete picture of the dielectric behaviour of silicon nitride. The analysis concludes with a method based on Dielectric Relaxation Spectroscopy for the calculation of the depletion layer width. © 2010 IEEE. en
heal.journalName 2010 27th International Conference on Microelectronics, MIEL 2010 - Proceedings en
dc.identifier.doi 10.1109/MIEL.2010.5490441 en
dc.identifier.spage 465 en
dc.identifier.epage 468 en


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