Progress in up-scaling of thin film silicon solar cells by large-area PECVD KAI systems

Meier, J; Kroll, U; Spitznagel, J; Benagli, S; Roschek, T; Pfanner, G; Ellert, C; Androutsopoulos, G; Hugli, A; Nagel, M; Bucher, C; Feitknecht, L; Buchel, G; Buchel, A

dc.contributor.author	Meier, J	en
dc.contributor.author	Kroll, U	en
dc.contributor.author	Spitznagel, J	en
dc.contributor.author	Benagli, S	en
dc.contributor.author	Roschek, T	en
dc.contributor.author	Pfanner, G	en
dc.contributor.author	Ellert, C	en
dc.contributor.author	Androutsopoulos, G	en
dc.contributor.author	Hugli, A	en
dc.contributor.author	Nagel, M	en
dc.contributor.author	Bucher, C	en
dc.contributor.author	Feitknecht, L	en
dc.contributor.author	Buchel, G	en
dc.contributor.author	Buchel, A	en
dc.date.accessioned	2014-03-01T02:49:57Z
dc.date.available	2014-03-01T02:49:57Z
dc.date.issued	2005	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/34824
dc.subject	Amorphous Silicon	en
dc.subject	Silicon Solar Cell	en
dc.subject	Thin Film	en
dc.subject	Next Generation	en
dc.title	Progress in up-scaling of thin film silicon solar cells by large-area PECVD KAI systems	en
heal.type	conferenceItem	en
heal.identifier.primary	10.1109/PVSC.2005.1488418	en
heal.identifier.secondary	http://dx.doi.org/10.1109/PVSC.2005.1488418	en
heal.publicationDate	2005	en
heal.abstract	UNAXIS KAI PECVD reactors developed for AM LCD technology have been demonstrated to possess a high potential for thin film silicon solar cells based on amorphous and microcrystalline silicon. For the next generation of thin film modules with highly effective light-trapping LP-CVD ZnO large-area deposition is developed at Unaxis as well, in combination with a very simple but effective back	en
heal.journalName	Photovoltaic Specialists, IEEE Conference	en
dc.identifier.doi	10.1109/PVSC.2005.1488418	en