An efficient methodology for integrated computer-aided design of cvd reactors: An application in tungsten/carbon codeposition

Xenidou, TC; Boudouvis, AG; Markatos, NC

dc.contributor.author	Xenidou, TC	en
dc.contributor.author	Boudouvis, AG	en
dc.contributor.author	Markatos, NC	en
dc.date.accessioned	2014-03-01T02:49:59Z
dc.date.available	2014-03-01T02:49:59Z
dc.date.issued	2005	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/34853
dc.relation.uri	http://www.scopus.com/inward/record.url?eid=2-s2.0-31744450060&partnerID=40&md5=3cf023dd3d059ca867a109a46d906941	en
dc.subject.other	Chemical vapor deposition	en
dc.subject.other	Computational fluid dynamics	en
dc.subject.other	Computer aided design	en
dc.subject.other	Evolutionary algorithms	en
dc.subject.other	Mass transfer	en
dc.subject.other	Tungsten compounds	en
dc.subject.other	Carrier gas	en
dc.subject.other	Codeposition	en
dc.subject.other	Kinetic parameters	en
dc.subject.other	Process parameters	en
dc.subject.other	Chemical reactors	en
dc.title	An efficient methodology for integrated computer-aided design of cvd reactors: An application in tungsten/carbon codeposition	en
heal.type	conferenceItem	en
heal.publicationDate	2005	en
heal.abstract	A two step design approach is used for the computational analysis of the chemical vapor deposition (CVD) of tungsten from W(CO)6/H2 mixture under low-pressure conditions. A computational fluid dynamics (CFD) model for the gas flow, heat and mass transfer in a single-wafer CVD reactor is coupled to a heterogeneous reaction mechanism for the film growth. An evolutionary algorithm (EA) is incorporated in the CFD/kinetic model and employed for the estimation of the kinetic parameters from available experimental data. The role of hydrogen as carrier gas is investigated and a codeposition mechanism of tungsten/carbon is extracted. The EA software is used further to determine the CVD process parameters under the objective of maximizing the growth rate while minimizing its non-uniformity across the wafer.	en
heal.journalName	Proceedings - Electrochemical Society	en
dc.identifier.volume	PV 2005-09	en
dc.identifier.spage	144	en
dc.identifier.epage	151	en