Multilayered thin film structures as photonic temperature sensors

Madamopoulos, N; Tsigara, A; Vainos, N; Kaminska, E; Piotrowska, A; Kibasi, K

dc.contributor.author	Madamopoulos, N	en
dc.contributor.author	Tsigara, A	en
dc.contributor.author	Vainos, N	en
dc.contributor.author	Kaminska, E	en
dc.contributor.author	Piotrowska, A	en
dc.contributor.author	Kibasi, K	en
dc.date.accessioned	2014-03-01T02:50:10Z
dc.date.available	2014-03-01T02:50:10Z
dc.date.issued	2005	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/34922
dc.subject.other	Magnetron sputtering	en
dc.subject.other	Monochromators	en
dc.subject.other	Optical sensors	en
dc.subject.other	Reflection	en
dc.subject.other	Refractive index	en
dc.subject.other	Signal interference	en
dc.subject.other	Multilayered thin film structures	en
dc.subject.other	Passive optical elements	en
dc.subject.other	Photonic temperature sensors	en
dc.subject.other	Temperature variations	en
dc.subject.other	Thin films	en
dc.title	Multilayered thin film structures as photonic temperature sensors	en
heal.type	conferenceItem	en
heal.identifier.primary	10.1109/CLEOE.2005.1568225	en
heal.identifier.secondary	http://dx.doi.org/10.1109/CLEOE.2005.1568225	en
heal.identifier.secondary	1568225	en
heal.publicationDate	2005	en
heal.abstract	Thin multilayered films fabricated by magnetron sputtering were built and tested as passive optical elements for the meassurement of temperature variations. They were studied for their performance and integrated into photonic temperature sensors. Photonic devices for temperature sensing applications are of interest because they can be remotely operated, which is advantageous in harsh environments, and they are immune to electromagnetic interference (EMI). The structures presented here are consisting of three or more alterating metal and metal-oxide layers of high optical quality with appropriate optical interferometric response. The design of the multilayered films, selection of materials and layer thickness, was based on achieving high modulation depth of the reflectivity as a function of wavelength or incidence angle. The materials used were Palladium, Platinum, Ruthenium, and Tin oxide. The individual film thickness ranges from 2nm to 500nm. Optical measurements under temperature variation are based on the reflectance signal by using a monochromatic optical source. The sub-nanometer range thermal expansion for the film structure has negligible effects in the meassured optical signal and thus excluded. First results show very reliable performance in the temperature range from 10 to 70°C. Previous work1 on multilayered structures showed that charge carrier excitation and lattice modification causes variations of the complex refractive index of the multilayered films. Hence, temperature variations cause the reflectivity of the multilayered film structure to change. The nanoscopic behavior of the grown systems is under further investigation. © 2005 IEEE.	en
heal.journalName	Conference on Lasers and Electro-Optics Europe - Technical Digest	en
dc.identifier.doi	10.1109/CLEOE.2005.1568225	en