dc.contributor.author |
Pavli, P |
en |
dc.contributor.author |
Petrou, PS |
en |
dc.contributor.author |
Douvas, AM |
en |
dc.contributor.author |
Makarona, E |
en |
dc.contributor.author |
Kakabakos, S |
en |
dc.contributor.author |
Dimotikali, D |
en |
dc.contributor.author |
Argitis, P |
en |
dc.date.accessioned |
2014-03-01T02:53:27Z |
|
dc.date.available |
2014-03-01T02:53:27Z |
|
dc.date.issued |
2011 |
en |
dc.identifier.issn |
18777058 |
en |
dc.identifier.uri |
https://dspace.lib.ntua.gr/xmlui/handle/123456789/36335 |
|
dc.subject |
12-phosphotungstic acid |
en |
dc.subject |
Non-fouling materials |
en |
dc.subject |
Photolithography |
en |
dc.subject |
Poly(vinyl alcohol) |
en |
dc.subject.other |
12-Phosphotungstic acid |
en |
dc.subject.other |
Bioelectronic device |
en |
dc.subject.other |
Entropy effects |
en |
dc.subject.other |
Nonfouling |
en |
dc.subject.other |
Protein adsorption |
en |
dc.subject.other |
Protein patterning |
en |
dc.subject.other |
PVA-based |
en |
dc.subject.other |
Selective immobilization |
en |
dc.subject.other |
Van Der Waals interactions |
en |
dc.subject.other |
Hydrogen bonds |
en |
dc.subject.other |
Photolithography |
en |
dc.subject.other |
Physisorption |
en |
dc.subject.other |
Polyvinyl alcohols |
en |
dc.subject.other |
Styrene |
en |
dc.subject.other |
Van der Waals forces |
en |
dc.subject.other |
Proteins |
en |
dc.title |
Selective immobilization of proteins guided by photo-patterned poly(vinyl alcohol) structures |
en |
heal.type |
conferenceItem |
en |
heal.identifier.primary |
10.1016/j.proeng.2011.12.072 |
en |
heal.identifier.secondary |
http://dx.doi.org/10.1016/j.proeng.2011.12.072 |
en |
heal.publicationDate |
2011 |
en |
heal.abstract |
The development of ""protein resistant"" materials is challenging since protein physisorption takes place on most surfaces due to van der Waals interactions, hydrogen bonding and entropy effects. In this work a new process for converting a surface resistant to protein adsorption is presented by using a photo-patternable poly(vinyl alcohol) (PVA) based film. This material minimizes effectively protein physisorption and it can be patterned through photolithography on top of any substrate. Herein the PVA-based film is patterned on top of a poly(styrene) (PS) film, in order to achieve selective protein patterning on the PS film and demonstrate the resistance of the PVA-based material to protein physisorption. The proposed methodology is expected to facilitate the fabrication of sensors and bioelectronic devices since it provides a patterning route with alignment capabilities for protein resistant-surfaces and it is based on an easy to implement process. © 2011 Published by Elsevier Ltd. |
en |
heal.journalName |
Procedia Engineering |
en |
dc.identifier.doi |
10.1016/j.proeng.2011.12.072 |
en |
dc.identifier.volume |
25 |
en |
dc.identifier.spage |
292 |
en |
dc.identifier.epage |
295 |
en |