Contact edge roughness and CD uniformity in EUV: Effect of photo acid generator and sensitizer

Kuppuswamy, V-KM; Constantoudis, V; Gogolides, E; Vaglio Pret, A; Gronhei, R

dc.contributor.author	Kuppuswamy, V-KM	en
dc.contributor.author	Constantoudis, V	en
dc.contributor.author	Gogolides, E	en
dc.contributor.author	Vaglio Pret, A	en
dc.contributor.author	Gronhei, R	en
dc.date.accessioned	2014-03-01T02:53:35Z
dc.date.available	2014-03-01T02:53:35Z
dc.date.issued	2012	en
dc.identifier.issn	0277786X	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/36432
dc.subject.other	CD Uniformity	en
dc.subject.other	CD variation	en
dc.subject.other	Contact edge roughness	en
dc.subject.other	Contact holes	en
dc.subject.other	EUV resists	en
dc.subject.other	Exposure dose	en
dc.subject.other	Low frequency	en
dc.subject.other	Photoacid generators	en
dc.subject.other	Sidewall roughness	en
dc.subject.other	Photoresistors	en
dc.subject.other	Spectrum analysis	en
dc.subject.other	Pollution	en
dc.title	Contact edge roughness and CD uniformity in EUV: Effect of photo acid generator and sensitizer	en
heal.type	conferenceItem	en
heal.identifier.primary	10.1117/12.918033	en
heal.identifier.secondary	http://dx.doi.org/10.1117/12.918033	en
heal.identifier.secondary	832207	en
heal.publicationDate	2012	en
heal.abstract	One of the main challenges for developing EUV resists is to satisfy sidewall roughness to allowable limit. With concern of this challenge, in this paper we study the effects of PAG and sensitizer concentration on the CD variation and roughness of contact holes in a EUV resist for a range of exposure doses by applying an advanced characterization methodology. It is found that the contact edge roughness(CER) parameters(RMS, ξ) merge when they are plotted versus the final CD value revealing the critical role of contact CD in the dependence of CER on PAG and sensitizer. This finding means that for specific target CD, different PAG and sensitizer concentrations modify only slightly contact edge roughness parameters. Power spectrum analysis reveals the importance of low frequency edge undulations in RMS dependence on CD. In addition, we found that CD Variation increase with sensitizer concentration. © 2012 SPIE.	en
heal.journalName	Proceedings of SPIE - The International Society for Optical Engineering	en
dc.identifier.doi	10.1117/12.918033	en
dc.identifier.volume	8322	en