Growth, structural and mechanical characterization and reliability of chemical vapor deposited Co and Co3O4 thin films as candidate materials for sensing applications

Tsikourkitoudi, VP; Koumoulos, EP; Papadopoulos, N; Charitidis, CA

dc.contributor.author	Tsikourkitoudi, VP	en
dc.contributor.author	Koumoulos, EP	en
dc.contributor.author	Papadopoulos, N	en
dc.contributor.author	Charitidis, CA	en
dc.date.accessioned	2014-03-01T02:53:39Z
dc.date.available	2014-03-01T02:53:39Z
dc.date.issued	2012	en
dc.identifier.issn	10139826	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/36468
dc.subject	Chemical Vapor Deposition	en
dc.subject	Co thin films	en
dc.subject	Co3O4 thin films	en
dc.subject	Nanoindentation	en
dc.subject	Nanomechanical Properties	en
dc.subject.other	Candidate materials	en
dc.subject.other	Chemical vapor deposited	en
dc.subject.other	Co thin films	en
dc.subject.other	Data storage devices	en
dc.subject.other	Deposition technique	en
dc.subject.other	Device reliability	en
dc.subject.other	Functional coating	en
dc.subject.other	Hardness and elastic modulus	en
dc.subject.other	Nanoindentation techniques	en
dc.subject.other	Nanomechanical property	en
dc.subject.other	Protective layers	en
dc.subject.other	Sensing applications	en
dc.subject.other	Si substrates	en
dc.subject.other	Storage technology	en
dc.subject.other	Structural and mechanical characterizations	en
dc.subject.other	Thin-film coatings	en
dc.subject.other	Total work	en
dc.subject.other	Wear analysis	en
dc.subject.other	Adhesion	en
dc.subject.other	Characterization	en
dc.subject.other	Chemical vapor deposition	en
dc.subject.other	Deposition	en
dc.subject.other	Elastic moduli	en
dc.subject.other	Growth (materials)	en
dc.subject.other	Hardness	en
dc.subject.other	Magnetic film storage	en
dc.subject.other	Mechanical stability	en
dc.subject.other	Nanoindentation	en
dc.subject.other	Protective coatings	en
dc.subject.other	Reliability analysis	en
dc.subject.other	Semiconducting silicon compounds	en
dc.subject.other	Sensors	en
dc.subject.other	Silica	en
dc.subject.other	Substrates	en
dc.subject.other	Thin films	en
dc.subject.other	Unloading	en
dc.subject.other	Vapors	en
dc.subject.other	Virtual storage	en
dc.subject.other	Cobalt	en
dc.title	Growth, structural and mechanical characterization and reliability of chemical vapor deposited Co and Co3O4 thin films as candidate materials for sensing applications	en
heal.type	conferenceItem	en
heal.identifier.primary	10.4028/www.scientific.net/KEM.495.108	en
heal.identifier.secondary	http://dx.doi.org/10.4028/www.scientific.net/KEM.495.108	en
heal.publicationDate	2012	en
heal.abstract	Abstract. The adhesion and mechanical stability of thin film coatings on substrates is increasingly becoming a key issue in device reliability as magnetic and storage technology driven products demand smaller, thinner and more complex functional coatings. In the present study, chemical vapor deposited Co and Co3O4 thin films on SiO2 and Si substrates are produced, respectively. Chemical vapor deposition is the most widely used deposition technique which produces thin films well adherent to the substrate. Co and Co3O4 thin films can be used in innovative applications such as magnetic sensors, data storage devices and protective layers. The produced thin films are characterized using nanoindentation technique and their nanomechanical properties (hardness and elastic modulus) are obtained. Finally, an evaluation of the reliability of each thin film (wear analysis) is performed using the hardness to elastic modulus ratio in correlation to the ratio of irreversible work to total work for a complete loading-unloading procedure. © (2012) Trans Tech Publications.	en
heal.journalName	Key Engineering Materials	en
dc.identifier.doi	10.4028/www.scientific.net/KEM.495.108	en
dc.identifier.volume	495	en
dc.identifier.spage	108	en
dc.identifier.epage	111	en