Characterisations of Co3O4 thin films deposited by DLI-MOCVD for the photoelectrocatalysis of water

Δεσποτοπούλου, Μυρτώ; Despotopoulou, Myrto

dc.contributor.author	Δεσποτοπούλου, Μυρτώ	el
dc.contributor.author	Despotopoulou, Myrto	en
dc.date.accessioned	2019-03-21T10:03:14Z
dc.date.available	2019-03-21T10:03:14Z
dc.date.issued	2019-03-21
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/48499
dc.identifier.uri	http://dx.doi.org/10.26240/heal.ntua.16310
dc.rights	Default License
dc.subject	Λεπτά υμένια	el
dc.subject	Φωτοηλεκτροκατάλυση νερού	el
dc.subject	Ιδιότητες	el
dc.subject	Φασματοσκοπικές μέθοδοι ανάλυσης	el
dc.subject	Τετροξείδιο του κοβαλτίου	el
dc.subject	Thin films	en
dc.subject	Cobalt tetroxide	el
dc.subject	Photoelectrocatalysis of water	el
dc.subject	Properties	el
dc.subject	Spectroscopic analysis methods	el
dc.title	Characterisations of Co3O4 thin films deposited by DLI-MOCVD for the photoelectrocatalysis of water	en
heal.type	bachelorThesis
heal.classification	Επιστήμη των Υλικών	el
heal.language	en
heal.access	free
heal.recordProvider	ntua	el
heal.publicationDate	2018-10-05
heal.abstract	A carbon-neutral way to produce molecular hydrogen, an energy carrier with great potential, is the water dissociation by photoelectrocatalysis. The solar water splitting process is based on the absorption of sunlight by the semiconducting materials of the anode and/or the cathode in a photoelectrochemical (PEC) device. In this project we are working on the case of a PEC cell where the photoanode is consisted of a TiO2 (n-type semiconductor) \| Co3O4 (p-type semiconductor) heterojunction of thin films deposited by Direct Liquid Injection - Metallorganic Chemical Vapour Deposition (DLI-MOCVD), in order to improve the solar to hydrogen energy conversion. Focusing on the Co3O4 thin films, we conduct a thorough analysis aiming to study the evolution of the films’ properties, as a function of the elaboration parameters (deposition temperature and deposition duration), for the integration in the heterojunction. The techniques we use are the FESEM, the XRD, the FTIR, the confocal Raman microscopy, the UV-vis-NIR spectroscopy and the spectroscopic ellipsometry. It was found that the deposition temperature and the deposition duration affect the morphology, the composition, the crystallinity and other functional properties. However, the deposition temperature has a greater impact than the deposition duration. The increase of the deposition temperature from 360°C to 500°C induces a change in the films’ morphology from columnar to more dense and cubic-shaped, an increase of the porosity and a decrease of the crystallite size. On the other hand, it does not interfere with the energy band gap, which affects the light absorption.	el
heal.sponsor	Erasmus+	en
heal.advisorName	Debieu, Olivier	fr
heal.advisorName	Vahlas, Constantin	fr
heal.advisorName	Μπουντουβής, Ανδρέας	el
heal.committeeMemberName	Βουγιούκα, Σταματίνα	el
heal.committeeMemberName	Debieu, Olivier	fr
heal.committeeMemberName	Μπουντουβής, Ανδρέας	el
heal.academicPublisher	Εθνικό Μετσόβιο Πολυτεχνείο. Σχολή Χημικών Μηχανικών. Τομέας Ανάλυσης, Σχεδιασμού και Ανάπτυξης Διεργασιών και Συστημάτων (ΙΙ)	el
heal.academicPublisherID	ntua
heal.numberOfPages	67 σ.
heal.fullTextAvailability	true