Structural order in a-Si:H:Cl films

Danesh, P; Savatinova, I; Anachkova, E; Georgiev, St; Anastassakis, E; Liarokapis, E

dc.contributor.author	Danesh, P	en
dc.contributor.author	Savatinova, I	en
dc.contributor.author	Anachkova, E	en
dc.contributor.author	Georgiev, St	en
dc.contributor.author	Anastassakis, E	en
dc.contributor.author	Liarokapis, E	en
dc.date.accessioned	2014-03-01T01:06:59Z
dc.date.available	2014-03-01T01:06:59Z
dc.date.issued	1987	en
dc.identifier.issn	0022-3093	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/9725
dc.subject.classification	Materials Science, Ceramics	en
dc.subject.classification	Materials Science, Multidisciplinary	en
dc.subject.other	CHLORINE	en
dc.subject.other	SEMICONDUCTING FILMS - Spectroscopic Analysis	en
dc.subject.other	SEMICONDUCTOR MATERIALS - Amorphous	en
dc.subject.other	SILICON AND ALLOYS - Films	en
dc.subject.other	SPECTROSCOPY, RAMAN	en
dc.subject.other	NONCRYSTALLINE SEMICONDUCTORS	en
dc.subject.other	SHORT RANGE ORDER	en
dc.subject.other	SEMICONDUCTING SILICON COMPOUNDS	en
dc.title	Structural order in a-Si:H:Cl films	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0022-3093(87)80432-5	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0022-3093(87)80432-5	en
heal.language	English	en
heal.publicationDate	1987	en
heal.abstract	Raman measurements of a-Si:H:Cl films have been carried out. The results show that there is an influence of chlorine concentration on the short range order of the amorphous silicon network. © 1987 Elsevier Science Publishers B.V.	en
heal.publisher	ELSEVIER SCIENCE BV	en
heal.journalName	Journal of Non-Crystalline Solids	en
dc.identifier.doi	10.1016/S0022-3093(87)80432-5	en
dc.identifier.isi	ISI:A1987G401400062	en
dc.identifier.volume	90	en
dc.identifier.issue	1-3	en
dc.identifier.spage	303	en
dc.identifier.epage	306	en