Internal stress in growing TiO2 films

Panagopoulos, ChrN

dc.contributor.author	Panagopoulos, ChrN	en
dc.date.accessioned	2014-03-01T01:07:11Z
dc.date.available	2014-03-01T01:07:11Z
dc.date.issued	1988	en
dc.identifier.issn	0022-5088	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/9838
dc.relation.uri	http://www.scopus.com/inward/record.url?eid=2-s2.0-0024067431&partnerID=40&md5=30ca361d631f23b5b3a830a94c320fc9	en
dc.subject.classification	Chemistry, Physical	en
dc.subject.classification	Metallurgy & Metallurgical Engineering	en
dc.subject.other	METALLIC COMPOUNDS - Stresses	en
dc.subject.other	TITANIUM COMPOUNDS - Thin Films	en
dc.subject.other	ANODIC OXIDES	en
dc.subject.other	OPEN-CIRCUIT STRESS	en
dc.subject.other	TITANIUM DIOXIDE	en
dc.subject.other	FILMS	en
dc.title	Internal stress in growing TiO2 films	en
heal.type	journalArticle	en
heal.language	English	en
heal.publicationDate	1988	en
heal.abstract	During the potentiostatic anodization of titanium, the anodic and opencircuit stresses were examined. The anodic stress was found to be compressive whereas the open-circuit stress was found to be tensile in anodic titanium dioxide. The anodic stress was observed to decrease and the open-circuit stress to increase slightly with increasing thickness of growin titanium dioxide. © 1988.	en
heal.publisher	ELSEVIER SCIENCE SA LAUSANNE	en
heal.journalName	Journal of The Less-Common Metals	en
dc.identifier.isi	ISI:A1988P479000018	en
dc.identifier.volume	141	en
dc.identifier.issue	2	en
dc.identifier.spage	335	en
dc.identifier.epage	343	en