A stochastic photoresist-polymer dissolution model combining the percolation and critical ionization models

Sarris, V; Patsis, GP; Constantoudis, V; Boudouvis, AG; Gogolides, E

dc.contributor.author	Sarris, V	en
dc.contributor.author	Patsis, GP	en
dc.contributor.author	Constantoudis, V	en
dc.contributor.author	Boudouvis, AG	en
dc.contributor.author	Gogolides, E	en
dc.date.accessioned	2014-03-01T01:21:46Z
dc.date.available	2014-03-01T01:21:46Z
dc.date.issued	2005	en
dc.identifier.issn	0021-4922	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/16361
dc.subject	Critical ionization	en
dc.subject	Line-edge roughness	en
dc.subject	Percolation	en
dc.subject	Photoresist dissolution	en
dc.subject.classification	Physics, Applied	en
dc.subject.other	Dissolution	en
dc.subject.other	Hydrophilicity	en
dc.subject.other	Ionization	en
dc.subject.other	Molecular weight	en
dc.subject.other	Polymers	en
dc.subject.other	Random processes	en
dc.subject.other	Surface roughness	en
dc.subject.other	Critical ionization	en
dc.subject.other	Line-edge roughness	en
dc.subject.other	Percolation model	en
dc.subject.other	Photoresists	en
dc.title	A stochastic photoresist-polymer dissolution model combining the percolation and critical ionization models	en
heal.type	journalArticle	en
heal.identifier.primary	10.1143/JJAP.44.7400	en
heal.identifier.secondary	http://dx.doi.org/10.1143/JJAP.44.7400	en
heal.language	English	en
heal.publicationDate	2005	en
heal.abstract	A new model for photoresist-polymer dissolution in aqueous base is presented combining the critical ionization model [P. C. Tsiartas et al.: Macromolecules 30 (1992) 4656] and the percolation model [A. Reiser et al.: Angew. Chem., Int. Ed. 35 (1996) 2428]. The dependence of dissolution rate on molecular weight and hydrophilic fraction of the polymer has been studied using the new model, as well as the ""gel"" layer thickness formed during dissolution. The new model predicts available experimental data, and can be a basis for line-edge roughness predictions. © 2005 The Japan Society of Applied Physics.	en
heal.publisher	INST PURE APPLIED PHYSICS	en
heal.journalName	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers	en
dc.identifier.doi	10.1143/JJAP.44.7400	en
dc.identifier.isi	ISI:000232739300038	en
dc.identifier.volume	44	en
dc.identifier.issue	10	en
dc.identifier.spage	7400	en
dc.identifier.epage	7403	en