Optimization of anisotropically etched silicon surface-relief gratings for substrate-mode optical interconnects

Wu, S-D; Gaylord, TK; Maikisch, JS; Glytsis, EN

dc.contributor.author	Wu, S-D	en
dc.contributor.author	Gaylord, TK	en
dc.contributor.author	Maikisch, JS	en
dc.contributor.author	Glytsis, EN	en
dc.date.accessioned	2014-03-01T01:24:49Z
dc.date.available	2014-03-01T01:24:49Z
dc.date.issued	2006	en
dc.identifier.issn	0003-6935	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/17448
dc.subject.classification	Optics	en
dc.subject.other	Incident angles	en
dc.subject.other	Random linear (RL) polarizations	en
dc.subject.other	Silicon surface-relief gratings	en
dc.subject.other	Slant angles	en
dc.subject.other	Algorithms	en
dc.subject.other	Annealing	en
dc.subject.other	Etching	en
dc.subject.other	Light polarization	en
dc.subject.other	Optical interconnects	en
dc.subject.other	Optimization	en
dc.subject.other	Silicon	en
dc.subject.other	Diffraction gratings	en
dc.title	Optimization of anisotropically etched silicon surface-relief gratings for substrate-mode optical interconnects	en
heal.type	journalArticle	en
heal.identifier.primary	10.1364/AO.45.000015	en
heal.identifier.secondary	http://dx.doi.org/10.1364/AO.45.000015	en
heal.language	English	en
heal.publicationDate	2006	en
heal.abstract	The optimum profiles of right-angle-face anisotropically etched silicon surface-relief gratings illuminated at normal incidence for substrate-mode optical interconnects are determined for TE, TM, and random linear (RL) polarizations. A simulated annealing algorithm in conjunction with the rigorous coupled-wave analysis is used. The optimum diffraction efficiencies of the -1 forward-diffracted order are 37.3%, 67.1%, and 51.2% for TE-, TM-, and RL-polarization-optimized profiles, respectively. Also, the sensitivities to grating thickness, slant angle, and incident angle of the optimized profiles are presented. (c) 2006 Optical Society of America.	en
heal.publisher	OPTICAL SOC AMER	en
heal.journalName	Applied Optics	en
dc.identifier.doi	10.1364/AO.45.000015	en
dc.identifier.isi	ISI:000234553600002	en
dc.identifier.volume	45	en
dc.identifier.issue	1	en
dc.identifier.spage	15	en
dc.identifier.epage	21	en