Stochastic modeling and simulation of photoresist surface and line-edge roughness evolution

Patsis, GP; Drygiannakis, D; Constantoudis, V; Raptis, I; Gogolides, E

dc.contributor.author	Patsis, GP	en
dc.contributor.author	Drygiannakis, D	en
dc.contributor.author	Constantoudis, V	en
dc.contributor.author	Raptis, I	en
dc.contributor.author	Gogolides, E	en
dc.date.accessioned	2014-03-01T01:34:41Z
dc.date.available	2014-03-01T01:34:41Z
dc.date.issued	2010	en
dc.identifier.issn	0014-3057	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/20794
dc.subject	Correlation length	en
dc.subject	Polymer dissolution	en
dc.subject	Roughness exponent	en
dc.subject	Self-affinity	en
dc.subject	Surface and line-edge roughness	en
dc.subject.classification	Polymer Science	en
dc.subject.other	Acid base	en
dc.subject.other	Base diffusion	en
dc.subject.other	Chain architecture	en
dc.subject.other	Correlation lengths	en
dc.subject.other	Degree of polymerization	en
dc.subject.other	Ionization fractions	en
dc.subject.other	Ionization model	en
dc.subject.other	Line Edge Roughness	en
dc.subject.other	Photoresist surfaces	en
dc.subject.other	Photosensitive materials	en
dc.subject.other	Polymer dissolution	en
dc.subject.other	Quasi-static	en
dc.subject.other	Roughness exponent	en
dc.subject.other	Self affinity	en
dc.subject.other	Self-affine	en
dc.subject.other	Stochastic modeling	en
dc.subject.other	Computer simulation	en
dc.subject.other	Dissolution	en
dc.subject.other	Ionization	en
dc.subject.other	Particle detectors	en
dc.subject.other	Photoresists	en
dc.subject.other	Polymer films	en
dc.subject.other	Polymeric films	en
dc.subject.other	Polymers	en
dc.subject.other	Roughness measurement	en
dc.subject.other	Soil structure interactions	en
dc.subject.other	Stochastic systems	en
dc.subject.other	Surfaces	en
dc.subject.other	Surface roughness	en
dc.title	Stochastic modeling and simulation of photoresist surface and line-edge roughness evolution	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/j.eurpolymj.2010.07.002	en
heal.identifier.secondary	http://dx.doi.org/10.1016/j.eurpolymj.2010.07.002	en
heal.language	English	en
heal.publicationDate	2010	en
heal.abstract	Polymeric photosensitive materials due to their vital role as imaging films in lithography should have low line-edge roughness (LER) in order to assist in continuous device shrinking. Through stochastic 2 dimensional simulations, it is indicated that a dissolving polymer film exhibits self-affine characteristics. Its surface roughness (SR) evolution is investigated using a dynamic dissolution algorithm based on critical ionization model. LER is studied with a fast quasi-static dissolution algorithm. Investigation of self-affine properties of both SR and LER has been performed in terms of degree of polymerization, chain architecture, and critical ionization fraction. No base diffusion and acid-base neutralization was considered in the study. (C) 2010 Elsevier Ltd. All rights reserved.	en
heal.publisher	PERGAMON-ELSEVIER SCIENCE LTD	en
heal.journalName	European Polymer Journal	en
dc.identifier.doi	10.1016/j.eurpolymj.2010.07.002	en
dc.identifier.isi	ISI:000283756200004	en
dc.identifier.volume	46	en
dc.identifier.issue	10	en
dc.identifier.spage	1988	en
dc.identifier.epage	1999	en