A comparative study of composition, structure and elastic properties of boron nitride films deposited by magnetron and ion beam sputtering

Logothetidis, S; Charitidis, C; Patsalas, P; Kehagias, T

dc.contributor.author	Logothetidis, S	en
dc.contributor.author	Charitidis, C	en
dc.contributor.author	Patsalas, P	en
dc.contributor.author	Kehagias, T	en
dc.date.accessioned	2014-03-01T01:47:46Z
dc.date.available	2014-03-01T01:47:46Z
dc.date.issued	1999	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/25312
dc.subject	Boron Nitride	en
dc.subject	Composite Structure	en
dc.subject	Elastic Properties	en
dc.subject	Ion Beam	en
dc.subject	Optical Properties	en
dc.subject	Spectroscopic Ellipsometry	en
dc.subject	Transmission Electron Microscopy	en
dc.subject	X Ray Diffraction	en
dc.subject	Fourier Transform	en
dc.subject	Infra Red	en
dc.title	A comparative study of composition, structure and elastic properties of boron nitride films deposited by magnetron and ion beam sputtering	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0925-9635(98)00434-8	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0925-9635(98)00434-8	en
heal.publicationDate	1999	en
heal.abstract	Sputtering from hexagonal BN targets, using a conventional magnetron (MS) or ion beam (IBS), produces films consisting of both sp2- and sp3-bonded BN and BNx. We present here the dependence of BN film composition, structure, morphology and elastic properties on the bias voltage (Vb) applied on the substrate in the case of MS, compared with those of IBS-deposited BN films.	en
heal.journalName	Diamond and Related Materials	en
dc.identifier.doi	10.1016/S0925-9635(98)00434-8	en