The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films

Patsalas, P; Charitidis, C; Logothetidis, S

dc.contributor.author	Patsalas, P	en
dc.contributor.author	Charitidis, C	en
dc.contributor.author	Logothetidis, S	en
dc.date.accessioned	2014-03-01T01:49:38Z
dc.date.available	2014-03-01T01:49:38Z
dc.date.issued	2000	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/25869
dc.subject	Bulk Density	en
dc.subject	Elastic Modulus	en
dc.subject	Grain Growth	en
dc.subject	Grain Size	en
dc.subject	Measurement Technique	en
dc.subject	Mechanical Property	en
dc.subject	Microstructures	en
dc.subject	Thin Film	en
dc.subject	Titanium Nitride	en
dc.subject	X Ray Diffraction	en
dc.title	The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films	en
heal.type	journalArticle	en
heal.identifier.primary	10.1016/S0257-8972(99)00606-4	en
heal.identifier.secondary	http://dx.doi.org/10.1016/S0257-8972(99)00606-4	en
heal.publicationDate	2000	en
heal.abstract	The mechanical properties of titanium nitride (TiNx) thin films have been investigated using depth sensing nanoindentation tests. The effects of substrate temperature (Ts) and of substrate biasing (Vb) on the mechanical properties and the microstructure of the TiNx films were studied. Ts and Vb have strong effect on the film's microstructural characteristics such as density, grain size and orientation. It	en
heal.journalName	Surface & Coatings Technology	en
dc.identifier.doi	10.1016/S0257-8972(99)00606-4	en