A Masking Approach for Anisotropic Silicon Wet Etching

Normand, P; Beltsios, K; Tserepi, A; Aidinis, K; Tsoukalas, D; Cardinaud, C

dc.contributor.author	Normand, P	en
dc.contributor.author	Beltsios, K	en
dc.contributor.author	Tserepi, A	en
dc.contributor.author	Aidinis, K	en
dc.contributor.author	Tsoukalas, D	en
dc.contributor.author	Cardinaud, C	en
dc.date.accessioned	2014-03-01T01:50:38Z
dc.date.available	2014-03-01T01:50:38Z
dc.date.issued	2001	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/26060
dc.title	A Masking Approach for Anisotropic Silicon Wet Etching	en
heal.type	journalArticle	en
heal.identifier.primary	10.1149/1.1398559	en
heal.identifier.secondary	http://dx.doi.org/10.1149/1.1398559	en
heal.publicationDate	2001	en
heal.journalName	Electrochemical and Solid State Letters	en
dc.identifier.doi	10.1149/1.1398559	en