Computational analysis of horizontal cold wall CVD reactors at low pressure: Application to tungsten deposition from pyrolysis of W(CO)6

Xenidou, TC; Koukou, MK; Boudouvis, AG; Markatos, NC

dc.contributor.author	Xenidou, TC	en
dc.contributor.author	Koukou, MK	en
dc.contributor.author	Boudouvis, AG	en
dc.contributor.author	Markatos, NC	en
dc.date.accessioned	2014-03-01T02:41:47Z
dc.date.available	2014-03-01T02:41:47Z
dc.date.issued	2001	en
dc.identifier.issn	1155-4339	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/30620
dc.subject	Computer Analysis	en
dc.subject	Low Pressure	en
dc.subject.classification	Physics, Multidisciplinary	en
dc.subject.other	Chemical vapor deposition	en
dc.subject.other	Computer simulation	en
dc.subject.other	Finite volume method	en
dc.subject.other	Heat transfer	en
dc.subject.other	Laminar flow	en
dc.subject.other	Mathematical models	en
dc.subject.other	Ohmic contacts	en
dc.subject.other	Partial pressure	en
dc.subject.other	Pyrolysis	en
dc.subject.other	Reaction kinetics	en
dc.subject.other	Silicon wafers	en
dc.subject.other	Temperature distribution	en
dc.subject.other	Thermal diffusion	en
dc.subject.other	Thin films	en
dc.subject.other	Tungsten	en
dc.subject.other	Cold wall reactors	en
dc.subject.other	Chemical reactors	en
dc.title	Computational analysis of horizontal cold wall CVD reactors at low pressure: Application to tungsten deposition from pyrolysis of W(CO)6	en
heal.type	conferenceItem	en
heal.identifier.primary	10.1051/jp4:2001323	en
heal.identifier.secondary	http://dx.doi.org/10.1051/jp4:2001323	en
heal.language	English	en
heal.publicationDate	2001	en
heal.abstract	A three-dimensional mathematical model has been developed for the simulation of horizontal cold wall CVD reactors aiming at the design and scale-up of new CVD reactors as well as at the optimisation of the operation of existing systems. The conservation equations of mass, momentum and energy are discretized by the finite-volume method and solved on a curvilinear non-orthogonal grid, assuming steady state conditions, laminar flow and ideal gas behaviour. The model accounts for the dependence of physical properties on temperature, pressure and composition, for realistic reaction kinetics, radiation, as well as for multi-component diffusion and thermal diffusion efforts. Results from the application of the model to the low-pressure deposition of tungsten from W(CO)(6) are presented and discussed.	en
heal.publisher	E D P SCIENCES	en
heal.journalName	Journal De Physique. IV : JP	en
dc.identifier.doi	10.1051/jp4:2001323	en
dc.identifier.isi	ISI:000171140300024	en
dc.identifier.volume	11	en
dc.identifier.issue	3	en
dc.identifier.spage	Pr3183	en
dc.identifier.epage	Pr3188	en