UV sub-ps laser pulse patterning of Mo/Si and W/Si multilayers for soft X-ray gratings

Majkova, E; Luby, S; Chushkin, Y; Jergel, M; Papazoglou, D; Manousaki, A; Fotakis, C; Zergioti, I; Sobota, J

dc.contributor.author	Majkova, E	en
dc.contributor.author	Luby, S	en
dc.contributor.author	Chushkin, Y	en
dc.contributor.author	Jergel, M	en
dc.contributor.author	Papazoglou, D	en
dc.contributor.author	Manousaki, A	en
dc.contributor.author	Fotakis, C	en
dc.contributor.author	Zergioti, I	en
dc.contributor.author	Sobota, J	en
dc.date.accessioned	2014-03-01T02:50:13Z
dc.date.available	2014-03-01T02:50:13Z
dc.date.issued	2005	en
dc.identifier.issn	0277786X	en
dc.identifier.uri	https://dspace.lib.ntua.gr/xmlui/handle/123456789/34970
dc.subject	Multilayer gratings	en
dc.subject	Multilayers	en
dc.subject	Sub-ps laser patterning	en
dc.subject.other	Diffraction gratings	en
dc.subject.other	Laser pulses	en
dc.subject.other	Molybdenum	en
dc.subject.other	Silicon	en
dc.subject.other	Tungsten	en
dc.subject.other	Ultraviolet radiation	en
dc.subject.other	X ray diffraction	en
dc.subject.other	Grating structures	en
dc.subject.other	Multilayer gratings	en
dc.subject.other	Pulse patterning	en
dc.subject.other	Sub-ps laser patterning	en
dc.subject.other	Multilayers	en
dc.title	UV sub-ps laser pulse patterning of Mo/Si and W/Si multilayers for soft X-ray gratings	en
heal.type	conferenceItem	en
heal.identifier.primary	10.1117/12.633704	en
heal.identifier.secondary	http://dx.doi.org/10.1117/12.633704	en
heal.identifier.secondary	34	en
heal.publicationDate	2005	en
heal.abstract	The micropatterning of multilayer gratings (MLG) using ultraviolet sub-ps laser pulses is described. A micromachining system operating with a 0.5 ps KrF laser (248 nm) was used. Grating structures with a groove width in sub-μm region were created in Mo/Si, Si/Mo, W/Si and Si/W multilayers (MLs) with 5 (in one case 10) periods, each 7 - 10 nm thick. Grating area was up to 900 × 900 μm2. Laser fluence on the samples varied between 60 and 710 mJcm-2. Atomic force microscopy, scanning electron microscopy, X-ray reflectivity and X-ray diffraction were used to characterize multilayers and gratings. MLs were locally ablated up to the Si, oxidized Si or glass substrate, or deeper, using from 1 to 5 pulses. The roughness on the surface of lines and in grooves of MLG increased with the depth of ablation. It was caused first of all by debris. The ω - scans around the 1st Bragg maximum show symmetric satellites up to the 2nd or 3rd order, giving the evidence that the ML in MLG is preserved.	en
heal.journalName	Proceedings of SPIE - The International Society for Optical Engineering	en
dc.identifier.doi	10.1117/12.633704	en
dc.identifier.volume	5850	en
dc.identifier.spage	264	en
dc.identifier.epage	270	en