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Contact edge roughness metrology in nanostructures: Frequency analysis and variations

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dc.contributor.author Vijaya-Kumar, MK en
dc.contributor.author Constantoudis, V en
dc.contributor.author Gogolides, E en
dc.contributor.author Pret, AV en
dc.contributor.author Gronheid, R en
dc.date.accessioned 2014-03-01T02:53:35Z
dc.date.available 2014-03-01T02:53:35Z
dc.date.issued 2012 en
dc.identifier.issn 01679317 en
dc.identifier.uri https://dspace.lib.ntua.gr/xmlui/handle/123456789/36433
dc.subject Contact edge roughness (CER) en
dc.subject Contact hole roughness (CHR) en
dc.subject Height-height correlation function en
dc.subject Image magnification en
dc.subject Image noise en
dc.subject Power spectrum en
dc.subject Scanning electron microscopy (SEM) en
dc.subject.other Contact edge roughness en
dc.subject.other Contact holes en
dc.subject.other Height-height correlation functions en
dc.subject.other Image magnification en
dc.subject.other Image noise en
dc.subject.other Scanning electrons en
dc.subject.other Power spectrum en
dc.subject.other Scanning electron microscopy en
dc.subject.other Frequency estimation en
dc.title Contact edge roughness metrology in nanostructures: Frequency analysis and variations en
heal.type conferenceItem en
heal.identifier.primary 10.1016/j.mee.2011.05.013 en
heal.identifier.secondary http://dx.doi.org/10.1016/j.mee.2011.05.013 en
heal.publicationDate 2012 en
heal.abstract A methodology for the evaluation and characterization of contact edge roughness using top-down images from scanning electron microscope is presented. Emphasis is given on the frequency and spatial aspects of CER and the estimation of the power spectrum and height-height correlation function. We also estimate the contribution of local and global process variations on the CER metrics of real contact holes with nominal critical dimension 50 nm as well as the effects of image magnification and noise smoothing filter. We find that local process variations have stronger contribution to the uncertainty of CD and CER parameters than image magnification and noise smoothing with the latter having the smallest impact. © 2011 Elsevier B.V. All rights reserved. en
heal.journalName Microelectronic Engineering en
dc.identifier.doi 10.1016/j.mee.2011.05.013 en
dc.identifier.volume 90 en
dc.identifier.spage 126 en
dc.identifier.epage 130 en


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