dc.contributor.author |
Vijaya-Kumar, MK |
en |
dc.contributor.author |
Constantoudis, V |
en |
dc.contributor.author |
Gogolides, E |
en |
dc.contributor.author |
Pret, AV |
en |
dc.contributor.author |
Gronheid, R |
en |
dc.date.accessioned |
2014-03-01T02:53:35Z |
|
dc.date.available |
2014-03-01T02:53:35Z |
|
dc.date.issued |
2012 |
en |
dc.identifier.issn |
01679317 |
en |
dc.identifier.uri |
https://dspace.lib.ntua.gr/xmlui/handle/123456789/36433 |
|
dc.subject |
Contact edge roughness (CER) |
en |
dc.subject |
Contact hole roughness (CHR) |
en |
dc.subject |
Height-height correlation function |
en |
dc.subject |
Image magnification |
en |
dc.subject |
Image noise |
en |
dc.subject |
Power spectrum |
en |
dc.subject |
Scanning electron microscopy (SEM) |
en |
dc.subject.other |
Contact edge roughness |
en |
dc.subject.other |
Contact holes |
en |
dc.subject.other |
Height-height correlation functions |
en |
dc.subject.other |
Image magnification |
en |
dc.subject.other |
Image noise |
en |
dc.subject.other |
Scanning electrons |
en |
dc.subject.other |
Power spectrum |
en |
dc.subject.other |
Scanning electron microscopy |
en |
dc.subject.other |
Frequency estimation |
en |
dc.title |
Contact edge roughness metrology in nanostructures: Frequency analysis and variations |
en |
heal.type |
conferenceItem |
en |
heal.identifier.primary |
10.1016/j.mee.2011.05.013 |
en |
heal.identifier.secondary |
http://dx.doi.org/10.1016/j.mee.2011.05.013 |
en |
heal.publicationDate |
2012 |
en |
heal.abstract |
A methodology for the evaluation and characterization of contact edge roughness using top-down images from scanning electron microscope is presented. Emphasis is given on the frequency and spatial aspects of CER and the estimation of the power spectrum and height-height correlation function. We also estimate the contribution of local and global process variations on the CER metrics of real contact holes with nominal critical dimension 50 nm as well as the effects of image magnification and noise smoothing filter. We find that local process variations have stronger contribution to the uncertainty of CD and CER parameters than image magnification and noise smoothing with the latter having the smallest impact. © 2011 Elsevier B.V. All rights reserved. |
en |
heal.journalName |
Microelectronic Engineering |
en |
dc.identifier.doi |
10.1016/j.mee.2011.05.013 |
en |
dc.identifier.volume |
90 |
en |
dc.identifier.spage |
126 |
en |
dc.identifier.epage |
130 |
en |