Advanced lithography models for strict process control in the 32 nm technology node

Patsis, GP; Drygiannakis, D; Raptis, I; Gogolides, E; Erdmann, A

URI: https://dspace.lib.ntua.gr/xmlui/handle/123456789/19348

Date: 2009

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Δημοσιεύσεις μελών Δ.Ε.Π. σε περιοδικά [21402]

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