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Nitrogen distribution during oxidation of low and medium energy nitrogen-implanted silicon

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Nitrogen distribution during oxidation of low and medium energy nitrogen-implanted silicon

Skarlatos, D; Perego, M; Tsamis, C; Ferrari, S; Fanciulli, M; Tsoukalas, D
URI: https://dspace.lib.ntua.gr/xmlui/handle/123456789/31125
Date: 2004

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