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Processing issues in silicon nanocrystal manufacturing by ultra-low-energy ion-beam-synthesis for non-volatile memory applications

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Processing issues in silicon nanocrystal manufacturing by ultra-low-energy ion-beam-synthesis for non-volatile memory applications

Normand, P; Dimitrakis, P; Kapetanakis, E; Skarlatos, D; Beltsios, K; Tsoukalas, D; Bonafos, C; Coffin, H; Benassayag, G; Claverie, A; Soncini, V; Agarwal, A; Sohl, Ch; Ameen, M
URI: https://dspace.lib.ntua.gr/xmlui/handle/123456789/31142
Date: 2004

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