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MOS Memory Using Silicon Nanocrystals Formed by Very-Low Energy Ion Implantation

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MOS Memory Using Silicon Nanocrystals Formed by Very-Low Energy Ion Implantation

Kapetanakis, E; Normand, P; Tsoukalas, D; Kamoulakos, G; Kouvatsos, D; Stoemenos, J; Zhang, S; Berg, J; Armour, D
URI: https://dspace.lib.ntua.gr/xmlui/handle/123456789/34182
Date: 2000

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