dc.contributor.author |
Papanikolaou, A |
en |
dc.contributor.author |
Miranda, M |
en |
dc.contributor.author |
Wang, H |
en |
dc.contributor.author |
Catthoor, F |
en |
dc.contributor.author |
Satyakiran, M |
en |
dc.contributor.author |
Marchal, P |
en |
dc.contributor.author |
Kaczer, B |
en |
dc.contributor.author |
Bruynseraede, C |
en |
dc.contributor.author |
Tokei, Z |
en |
dc.date.accessioned |
2014-03-01T02:50:16Z |
|
dc.date.available |
2014-03-01T02:50:16Z |
|
dc.date.issued |
2006 |
en |
dc.identifier.uri |
https://dspace.lib.ntua.gr/xmlui/handle/123456789/35014 |
|
dc.subject |
Embedded System Design |
en |
dc.subject |
Energy Consumption |
en |
dc.subject |
Paradigm Shift |
en |
dc.subject |
Quality Metric |
en |
dc.subject |
System Level Design |
en |
dc.subject |
Technology Scaling |
en |
dc.subject |
Deep Sub Micron |
en |
dc.subject |
Time Dependent |
en |
dc.title |
Reliability issues in deep deep sub-micron technologies: time-dependent variability and its impact on embedded system design |
en |
heal.type |
conferenceItem |
en |
heal.identifier.primary |
10.1109/VLSISOC.2006.313258 |
en |
heal.identifier.secondary |
http://dx.doi.org/10.1109/VLSISOC.2006.313258 |
en |
heal.publicationDate |
2006 |
en |
heal.abstract |
Technology scaling has traditionally offered advantages to embedded system design in terms of reduced energy consumption and cost and increased performance. Scaling past the 45 nm tech- nology node, however, brings a host of problems, whose impact on system-level design has not been evaluated. Random intra- die process variability, reliability and their combined impact on the system level parametric quality |
en |
heal.journalName |
Very Large Scale Integration |
en |
dc.identifier.doi |
10.1109/VLSISOC.2006.313258 |
en |