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Etching of SiO2 features in fluorocarbon plasmas: Explanation and prediction of gas-phase-composition effects on aspect ratio dependent phenomena in trenches

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Etching of SiO2 features in fluorocarbon plasmas: Explanation and prediction of gas-phase-composition effects on aspect ratio dependent phenomena in trenches

Kokkoris, G; Gogolides, E; Boudouvis, AG
URI: https://dspace.lib.ntua.gr/xmlui/handle/123456789/14683
Date: 2002

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