HEAL DSpace

Etching of SiO2 and Si in fluorocarbon plasmas: A detailed surface model accounting for etching and deposition

DSpace/Manakin Repository

Etching of SiO2 and Si in fluorocarbon plasmas: A detailed surface model accounting for etching and deposition

Gogolides, E; Vauvert, P; Kokkoris, G; Turban, G; Boudouvis, AG
URI: https://dspace.lib.ntua.gr/xmlui/handle/123456789/25950
Date: 2000

Show full item record

Files in this item

Files Size Format View

There are no files associated with this item.

This item appears in the following Collection(s)