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Simulation of SiO2 and Si feature etching for microelectronics and microelectromechanical systems fabrication: A combined simulator coupling modules of surface etching, local flux calculation, and profile evolution

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Simulation of SiO2 and Si feature etching for microelectronics and microelectromechanical systems fabrication: A combined simulator coupling modules of surface etching, local flux calculation, and profile evolution

Kokkoris, G; Tserepi, A; Boudouvis, AG; Gogolides, E
URI: https://dspace.lib.ntua.gr/xmlui/handle/123456789/31160
Date: 2004

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